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Showing 1 to 4 of 4 for “"High Power Pulsed Magnetron Sputtering (HPPMS)"”.
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Magnetic field optimization for high power impulse magnetron sputtering
"High Power Pulsed Magnetron Sputtering (HPPMS) or High Power Impulse Magnetron Sputtering (HiPIMS) is a promising Physical Vapor Deposition technique with several advantages over DC Magnetron Sputtering (dcMS). HiPIMS has gained a lot of interest in the recent years from the coating industries. …
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Linear magnetron high deposition rate magnet pack for high power impulse magnetron sputtering
High Power Impulse Magnetron Sputtering (HiPIMS) or High Power Pulsed Magnetron Sputtering (HPPMS) is a magnetron sputtering method that has proven to be a promising ionized physical vapor deposition (PVD) technique, with industrial implementation hindered by low deposition rates. HiPIMS applies …
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Process property relations in reactively sputtered transition metal compounds
… metal compound thin films grown by reactive magnetron sputtering techniques are investigated. In the first part, the effect of energetic species, which are generated by backscattering of plasma ions at the target, on the growth and the properties of transition metal nitride films deposition …
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Comparison of high power impulse magnetron sputtering and modulated pulsed power sputtering for interconnect metallization
… penetration, and create less overhang due to the high directionality of ion flux. In this work, high power impulse magnetron sputtering (HiPIMS) and its derivative, modulated pulsed power (MPP) magnetron sputtering, with their claimed high ionization capability, are proposed for the application of …