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Showing 1 to 8 of 8 for “"High Power Impulse Magnetron Sputtering (HiPIMS)"”.

  1. High power impulse magnetron sputtering (HIPIMS) : Fundamental plasma studies and material synthesis.

    … physical vapour deposition technology entitled high power impulse magnetron sputtering (HIPIMS) was suggested. The principle of HIPIMS is to utilize impulses (short pulses) of high power delivered to the target in order to generate high amount of metal ions with degree of metal ionization up to …

    sheffield-hallam Repository record for High power impulse magnetron sputtering (HIPIMS) : Fundamental plasma studies and material synthesis. (opens in a new tab)

  2. Development of high temperature/oxidation- resistant PVD coatings for cutting tools using HIPIMS

    A series of high temperature and oxidation resistant, nanoscale, multilayer PVD, hard coatings have been developed through combine DC Unbalanced Magnetron (UBM) and High Power Impulse Magnetron Sputtering (HIPIMS) deposition technologies. The properties of the coatings lend themselves to the …

    sheffield-hallam Repository record for Development of high temperature/oxidation- resistant PVD coatings for cutting tools using HIPIMS (opens in a new tab)

  3. Magnetic field optimization for high power impulse magnetron sputtering

    "High Power Pulsed Magnetron Sputtering (HPPMS) or High Power Impulse Magnetron Sputtering (HiPIMS) is a promising Physical Vapor Deposition technique with several advantages over DC Magnetron Sputtering (dcMS). HiPIMS has gained a lot of interest in the recent years from the coating industries. …

    uiuc Repository record for Magnetic field optimization for high power impulse magnetron sputtering (opens in a new tab)

  4. Growth defects in CrN/NbN coatings deposited by HIPIMS/UBM techniques

    In recent years, high power impulse magnetron sputtering (HIPIMS) has caught the attention of users due to its ability to produce dense coatings. However, microscopic studies have shown that HIPIMS deposited coatings can suffer from some surface imperfections even though the overall number of …

    sheffield-hallam Repository record for Growth defects in CrN/NbN coatings deposited by HIPIMS/UBM techniques (opens in a new tab)

  5. Development of nanostructured PVD coatings for total knee replacement joints using HIPIMS.

    … coatings for total knee replacement joints using high power impulse magnetron sputtering (HIPIMS). An industrial size four cathode magnetron sputtering system equipped with direct current (DC) and HIPIMS power supplies was used for this purpose. Initially, Plasma diagnostics were carried out using …

    sheffield-hallam Repository record for Development of nanostructured PVD coatings for total knee replacement joints using HIPIMS. (opens in a new tab)

  6. Linear magnetron high deposition rate magnet pack for high power impulse magnetron sputtering

    High Power Impulse Magnetron Sputtering (HiPIMS) or High Power Pulsed Magnetron Sputtering (HPPMS) is a magnetron sputtering method that has proven to be a promising ionized physical vapor deposition (PVD) technique, with industrial implementation hindered by low deposition rates. HiPIMS applies …

    uiuc Repository record for Linear magnetron high deposition rate magnet pack for high power impulse magnetron sputtering (opens in a new tab)

  7. Ultra-thin boron nitride films by pulsed laser deposition: Plasma diagnostics, synthesis, and device transport

    … of boron nitride, in this case, is driven by the high kinetic energies and chemical reactivities of the condensing species formed from physical vapor deposition (PVD) processes, which can facilitate growth over large areas and at reduced substrate temperatures. The use of optical emission …

    purdue-thes Repository record for Ultra-thin boron nitride films by pulsed laser deposition: Plasma diagnostics, synthesis, and device transport (opens in a new tab)

  8. Comparison of high power impulse magnetron sputtering and modulated pulsed power sputtering for interconnect metallization

    … penetration, and create less overhang due to the high directionality of ion flux. In this work, high power impulse magnetron sputtering (HiPIMS) and its derivative, modulated pulsed power (MPP) magnetron sputtering, with their claimed high ionization capability, are proposed for the application of …

    uiuc Repository record for Comparison of high power impulse magnetron sputtering and modulated pulsed power sputtering for interconnect metallization (opens in a new tab)