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Showing 1 to 1 of 1 for “"Hi-silicate"”.

  1. Reliability Studies of TiN/Hf-Silicate Based Gate Stacks

    Hafnium-silicate based oxides are among the leading candidates to be included into the first generation of high-[Kappa] gate stacks in nano-scale CMOS technology because of their distinct advantages as far as thermal stability, leakage characteristics, threshold stability and low mobility …

    njit Repository record for Reliability Studies of TiN/Hf-Silicate Based Gate Stacks (opens in a new tab)