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Showing 1 to 8 of 8 for “"HWCVD"”.
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A study of hydrogenated nanocrystalline silicon thin films deposited by hot-wire chemical vapour deposition (HWCVD)
… of the hot – wire chemical vapour deposition (HWCVD) technique and have been characterised for their performance. It is noticed that hydrogenated nanocrystalline silicon is similar in some aspects (mainly optical) to its counterpart amorphous silicon actually used as the intrinsic layer in the …
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Hot-wire chemical vapour deposition of nanocrystalline silicon and silicon nitride : growth mechanisms and filament stability
… during the hot-wire chemical vapour deposition (HWCVD) of nc-Si:H and SiNₓ thin films. During the HWCVD of nc-Si:H, electron backscatter diffraction (EBSD) revealed that the tantalum (Ta) filament aged to consists of a recrystallized Ta-core with Ta-rich silicides at the hotter centre regions and …
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Application and analysis of the constant photocurrent method in studies on amorphous silicon and other thin-film semiconductors
… reactor and hot-wire chemical vapour deposition (HWCVD) in a laboratory setup, are subject to light-soaking and annealing and investigated using transient photoconductivity (TPC) and constant photocurrent (CPM) measurements. As a result it is to be found thatthe HWCVD produced material is …
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Light induced degradation in hydrogenated amorphous silicon (a-Si:H)
… by hot wire chemical vapour deposition system (HWCVD) on glass and silicon substrates at different temperatures ranging from 250Light induced degradation in the microstructure and optical properties of a series of hydrogenated amorphous silicon (a-Si:H) layers, deposited by hot wire chemical …
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Determination of the gas-flow patterns inside the hot-wire chemical vapor deposition system, using computational fluids dynamics software (fluent)
… the hot-wire chemical vapor deposition system (HWCVD) with the two deposited substrates (glass and Silicon). This process is performed by the solar cells group of the Physics department at the University of the Western Cape. In this thesis, the simulation is done using a CFD software package …
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Electrical characterisation of simple a-Si:H and nc-Si devices on paper substrates deposited by hot wire chemical vapour deposition and printing techniques
… obtained by hot wire chemical vapour deposition (HWCVD), and printed nanocrystalline silicon (nc-Si), both deposited on a flexible, lightweight substrate of 80 g m-2 wood-free paper. For different devices such as field effect transistors and n-i-p solar cells, electrical measurements will be …
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Silicon nanoparticle sysnthesis through thermal catalytic pyrolysis
… of the hot wire chemical vapour deposition (HWCVD) reactor, this method is further investigated as a suitable route to nanoparticle production. The objective of this research is thus to produce Si nanoparticles (powder) in sufficient quantities, through thermal catalytic pyrolysis, while …
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Numerical Analysis and Optimal Design of Efficient Thin-Film Solar Cells with Novel Buffer Layers
… and hot wire chemical vapor deposition (HWCVD), crystalline silicon films should not be deposited directly on a glass substrate but need to be fabricated by the post treatment of amorphous silicon films, for making thin film solar cell with buffer layer. In this work, beside SiC, buffer …