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Showing 1 to 20 of 28 for “"Ge/Si"”.

  1. Commercialization potential of compositionally graded Ge - Si₁₋x̳Gex̳ - Si substrates for solar applications

    This project considers the potential of Ge - Si₁₋x̳Gex̳ - Si substrates for solar applications. The use of compositionally graded substrates to achieve heterointegration across different materials platforms such as Si, Ge and GaAs has proven successful and dual junction solar cells have been …

    mit Repository record for Commercialization potential of compositionally graded Ge - Si₁₋x̳Gex̳ - Si substrates for solar applications (opens in a new tab)

  2. Structural and Electrical Properties of In and C + In implanted Ge, Si, and Si₁ˍₓGeₓ

    It is widely accepted that when transistors are scaled beyond the 10-nm technology generation in the near future, Ge, or alternatively Si1-xGex will potentially replace Si as the channel material to maintain CMOS device performance improvement. In is one of the most promising p-type dopant in Ge

    aus-cath Repository record for Structural and Electrical Properties of In and C + In implanted Ge, Si, and Si₁ˍₓGeₓ (opens in a new tab)

  3. Structural and Electrical Properties of In and C + In implanted Ge, Si, and Si₁ˍₓGeₓ

    It is widely accepted that when transistors are scaled beyond the 10-nm technology generation in the near future, Ge, or alternatively Si1-xGex will potentially replace Si as the channel material to maintain CMOS device performance improvement. In is one of the most promising p-type dopant in Ge

    anu Repository record for Structural and Electrical Properties of In and C + In implanted Ge, Si, and Si₁ˍₓGeₓ (opens in a new tab)

  4. Croissance de Ge/Si et investigation de la contrainte thermique dans un substrat virtuel à base de nano-cavités

    L’intégration des matériaux III-V sur silicium (Si), est une voie prometteuse de développement des composants optoélectroniques III-V à hautes performances et à faible coût. Cependant les différences entre les propriétés intrinsèques des matériaux III-V et le Si (paramètre de maille, différence de …

    sherbrooke Repository record for Croissance de Ge/Si et investigation de la contrainte thermique dans un substrat virtuel à base de nano-cavités (opens in a new tab)

  5. Quantum oscillation studies in the unconventional superconductor YFe₂Ge₂ and in the Dirac semimetal candidates NbXSb (X = Ge/Si)

    … to probe the ground state dynamics of YFe₂Ge₂, NbGeSb and NbSiSb. An unusually large Sommerfeld coefficient (γ ~ 100 mJmol⁻¹K⁻²) has been observed in the d-electron system YFe₂Ge₂. It also shows an anomalous power law temperature dependence of the electrical resistivity (ρ = ρ0 + AT³⁄²) …

    cambridge Repository record for Quantum oscillation studies in the unconventional superconductor YFe₂Ge₂ and in the Dirac semimetal candidates NbXSb (X = Ge/Si) (opens in a new tab)

  6. Propiedades y dependencia composicional de las transformaciones martensíticas en intermetálicos metaestables basados en MnCo(Fe)Ge(Si) y NiFe(Co)Ga

    En esta tesis se va a llevar a cabo un estudio detallado de materiales basados en sistemas del tipo NiFeGa(Co) y Mn(CoFe)(GeSi)(B), con el fin de comprender sus transformaciones magnetoestructurales y las propiedades térmicas y magnéticas asociadas. Se prestará especial atención a la relación …

    sevilla Repository record for Propiedades y dependencia composicional de las transformaciones martensíticas en intermetálicos metaestables basados en MnCo(Fe)Ge(Si) y NiFe(Co)Ga (opens in a new tab)

  7. Bi surfactant mediated growth for fabrication of Si,Ge nanostructures and investigation of Si,Ge intermixing by STM

    Heteroepitaxial growth of Ge on Si is a prototypical system for studying strained Stranski-Krastanow growth.The technological drawback is that it turns out to be difficult to grow Ge on Si in a controlled layer-by-layer manner. After a few smooth layers have been grown epitaxially, the growth then …

    aachen Repository record for Bi surfactant mediated growth for fabrication of Si,Ge nanostructures and investigation of Si,Ge intermixing by STM (opens in a new tab)

  8. Empirical correlation of minority carrier lifetime to detect density profile in germanium on silicon heteroepitaxy

    High-quality Ge-on-Si (GoS) heterostructures are pursued for many applications, including near infrared (NIR) photodetectors and integration with III-V films for multi-junction photovoltaics. However, challenges such as thermal expansion coefficient mismatch and lattice mismatch between Ge and Si

    unm Repository record for Empirical correlation of minority carrier lifetime to detect density profile in germanium on silicon heteroepitaxy (opens in a new tab)

  9. Quantitative Electron Microscopy Studies of Silicon Germanium/silicon(001)

    … strain energy in mismatched epitaxial systems. Ge/Si(001) has been investigated for its potential importance technologically, as well as serving as a model system. However, it has been difficult to obtain data on how the strain in these islands effects the island's thermodynamic properties and …

    uiuc Repository record for Quantitative Electron Microscopy Studies of Silicon Germanium/silicon(001) (opens in a new tab)

  10. Phosphorus Incorporation During Silicon(001):phosphorus Gas-Source Molecular Beam Epitaxy: Effects on Film Growth Kinetics, Surface Morphology, and the Self-Organization of Germanium Quantum Dot Overlays

    … the effect of growth rate and P predeposition on Ge/Si(001) island geometry, density, and spatial distributions. Ge quantum dots are deposited on three types of starting surfaces: (1) Si(001) buffer layers which serve as a reference, (2) Si(001) layers with predeposited P coverages …

    uiuc Repository record for Phosphorus Incorporation During Silicon(001):phosphorus Gas-Source Molecular Beam Epitaxy: Effects on Film Growth Kinetics, Surface Morphology, and the Self-Organization of Germanium Quantum Dot Overlays (opens in a new tab)

  11. Selective epitaxial growth techniques to integrate high-quality germanium on silicon

    High-quality Ge-on-Si heterostructures have been actively pursued for many advanced applications, including near-infrared photodetectors, high-mobility field effect transistors, and virtual substrates for integrating III-V multijunction solar cells. However, growing epitaxial Ge on Si poses many …

    unm Repository record for Selective epitaxial growth techniques to integrate high-quality germanium on silicon (opens in a new tab)

  12. Integration of GaAsP alloys on SiGe virtual substrates for Si-based dual-junction solar cells

    Integration of III-V compound semiconductors with silicon is an area that has generated a lot of interest because III-V materials and Si are best suited for different types of devices. Monolithic integration enables the best material to be chosen for each application, enabling new functionalities …

    mit Repository record for Integration of GaAsP alloys on SiGe virtual substrates for Si-based dual-junction solar cells (opens in a new tab)

  13. Ab-initio simulation of novel solid electrolytes

    … low. Reports of fast lithium conduction in Li 0GeP 2S1 2 (LGPS), with conductivity of 12 mS/cm at room temperature, have shown that Li -diffusion in solid electrolytes can match or exceed the liquid electrolytes in use today. I report results of ab-initio calculations on a related system of …

    mit Repository record for Ab-initio simulation of novel solid electrolytes (opens in a new tab)

  14. Minority carrier lifetimes in germanium on silicon heterostructures

    Photodiodes sensitive in the NIR and integratable with Si have been pursued for many applications including imaging, communications, and photovoltaics. Since the Si bandgap is inefficiently matched to NIR wavelengths, photodiodes fabricated from a smaller bandgap material are needed. 25 nm …

    unm Repository record for Minority carrier lifetimes in germanium on silicon heterostructures (opens in a new tab)

  15. LARGE-AREA, WAFER-SCALE EPITAXIAL GROWTH OF GERMANIUM ON SILICON AND INTEGRATION OF HIGH-PERFORMANCE TRANSISTORS

    Building on a unique two-step, simple MBE growth technique, we have investigated possible dislocation locking mechanisms by dopant impurities, coupled with artificially introduced oxygen. In the case of n-type Ge grown on Si, our materials characterization indicates that the dislocation density …

    unm Repository record for LARGE-AREA, WAFER-SCALE EPITAXIAL GROWTH OF GERMANIUM ON SILICON AND INTEGRATION OF HIGH-PERFORMANCE TRANSISTORS (opens in a new tab)

  16. Deposition and Characterization of Silicon Nitride/gallium Arsenide Metal Insulator Semiconductor Structures With Heteroepitaxial Interlayers

    In this thesis, an in-depth study of the growth and characterization of GaAs MIS structures with strained heterointerlayers has been undertaken by exploiting the unique and powerful capabilities of the Epicenter growth and analysis facilities at the University of Illinois. The novel heteroepitaxial …

    uiuc Repository record for Deposition and Characterization of Silicon Nitride/gallium Arsenide Metal Insulator Semiconductor Structures With Heteroepitaxial Interlayers (opens in a new tab)

  17. Monte Carlo Simulation Of Hole Transport And Terahertz Amplification In Multilayer Delta Doped Semiconductor Structures

    Monte Carlo method for the simulation of hole dynamics in degenerate valence subbands of cubic semiconductors is developed. All possible intra- and inter-subband scattering rates are theoretically calculated for Ge, Si, and GaAs. A far-infrared laser concept based on intersubband transitions of …

    ucf

  18. Heteroepitaxial Germanium-on-Silicon Thin-Films for Electronic and Photovoltaic Applications

    … and 32% under AM0. However, the expensive cost has made it challenging for III-V solar cells to compete with the mainstream Silicon (Si) technology. Novel approaches to lower down the cost per watt for III-V solar cells will position them to be among the key contenders in the renewable …

    vt Repository record for Heteroepitaxial Germanium-on-Silicon Thin-Films for Electronic and Photovoltaic Applications (opens in a new tab)

  19. III-V compositionally graded buffers for heterostructure integration

    … commercial applications such as high speed transistors, light emitting diodes, solid state lasers, photovoltaics, and photo-detectors. However, the range of compositions used in these applications is often limited to the range of InyGa₁-yAs compositions which are lattice matched to elementary or …

    mit Repository record for III-V compositionally graded buffers for heterostructure integration (opens in a new tab)

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