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Showing 1 to 20 of 122 for “"Film deposition"”.
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Multiscale modeling of thin film deposition processes
Ionized physical vapor deposition (IPVD) and electrochemical deposition (ECD) are two major thin film deposition processes in the microelectronics industry. The ion fluxes with high kinetic energies in IPVD process involve complex surface interactions that affect overall topology of the microscale …
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Tomato Juice Film Deposition on Heat Exchanger Coils
Made available in DSpace on 2014-12-05T19:06:35Z (GMT). No. of bitstreams: 1 0010439.pdf: 5267736 bytes, checksum: 64cdf2602276ba91190bb2a6760ca940 (MD5) Previous issue date: 1954
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Large-Scale Graphene Film Deposition for Monolithic Device Fabrication
… are several techniques to produce graphene films. Among these techniques, chemical vapor deposition (CVD) offers a very convenient method to fabricate films for large-scale graphene films. Though CVD method is suitable for large area growth of graphene, the need for transferring a graphene …
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Ion assisted magnetron sputtering of tantalum thin film deposition and characterization
… on the crystallographic phases of tantalum films during their deposition by magnetron sputtering process, and to gain understanding of the mechanism of the ion-solid interactions during the thin film growth. Tantalum (Ta) exists in two distinct crystallographic phases: a stable [alpha]-phase …
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Optimization of the automated spray layer-by-layer technique for thin film deposition
… of the automated Spray-LbL technique for thin film deposition have been investigated in order to-identify their effects on film thickness and roughness. We use the automated Spray-LbL system developed at MIT by the Hammond lab to build 25 bilayer films of poly (ally amine hydrochloride) (PAH) …
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Plasma diagnostics and ITO film deposition by RF-assisted closed-field dual magnetron system
Deposition of indium tin oxide (ITO) among various transparent conductive materials on flexible organic substrates has been intensively investigated among academics and industrials for a whole new array of imaginative optoelectronic products. One critical challenge coming with the organic materials …
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An Investigation of Flow-Limited Field-Injection Electrostatic Spraying (Ffess) and Its Applications to Thin Film Deposition
Deposition of TiO2 and silver thin films using multi jet FFESS is studied, demonstrating great control on film morphology and properties. TiO2 thin films deposited on high-intensity discharge arc lamps are found to improve the quality of its light output. Silver thin films of high purity and …
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Solution-Processed Thin Film Deposition and Characterization of Multinary Chalcogenides: Towards Highly Efficient Cu2BaSn(S,Se)4 Solar Devices
… level comparable to already commercialized thin-film solar energy converting technologies. The I2-II-IV-VI4 (I = Li, Cu, Ag; II = Ba, Sr; IV = Si, Ge, Sn; VI = S, Se) family of materials offer tunable structural, optical, and electronic properties that can potentially enable their pervasive …
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Electroless Atomic Layer Deposition
Thin film growth is studied by many researchers because of broad applications and significant impact on technological development in modern era. However, thin film nucleation and growth is challenging task for many materials with high surface energy and melting temperature. Such systems tend to …
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Organic Thin Films Deposited by Emulsion-Based, Resonant Infrared, Matrix-Assisted Pulsed Laser Evaporation: Fundamentals and Applications
<p>Thin film deposition techniques are indispensable to the development of modern technologies as thin film based optical coatings, optoelectronic devices, sensors, and biological implants are the building blocks of many complicated technologies, and their performance heavily depends on the applied …
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H-Mediated Film Growth and Dopant Incorporation Kinetics During Silicon Germanium(001):boron Gas-Source Molecular Beam Epitaxy
… of B doped Si 1-xGex(001) GS-MBE were modeled. Film deposition rates RSiGe decrease by ≈50% with increasing CB ≥ 5 x 1019 cm-3 at Ts = 500°C. The TPD results were used to determine the B segregation enthalpy, -0.4 eV, significantly lower than the value for Si(001):B, -0.53 eV.
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Atmospheric pressure plasma chemical deposition by using dielectric barrier discharge system
… modification and sterilization. Lately thin film deposition and etching applications of atmospheric plasmas are being extensively investigated. For efficient film deposition process, a high frequency power source and an additional heating scheme are generally preferred even in atmospheric …
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Development of Ti-Si-N and Ta-Si-N as diffusion barriers
"Sputter deposited Ti-Si-N and Ta-Si-N films with different compositions were fabricated using Ti, Si, TiSi₂, and Ta targets in Ar/N₂ plasmas with a variety of deposition parameters. A fractional factorial design (FFD) method was used to identify the significant deposition variables for the Ti-Si-N …
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Surface Reaction Mechanisms for Plasma Processing of Semiconductors
… polymer from trenches following etching and the deposition of a continuous barrier layer are critical processes for integration PS as ILDs. To investigate these issues, a reaction mechanism for plasma stripping of residual fluorocarbon polymer using oxygen-based chemistries has been developed and …
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Re-strengthening demineralized bone via tannin-iron crosslinking
… Using tannin iron complexes we show that thin film deposition of the complexes are not only possible but effective at strengthening demineralized bone. Furthermore we show that by taking advantage of newly discovered tris-complexes that are able to form between tannic acid and ferrous iron ion …
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MEMS structures for stress measurements for thin films deposited using CVD
Mechanical stress in thin films is an important reliability issue in microelectronic devices and systems. The presence of large stresses can lead to the formation of defects that can cause device failure. The ability to control the magnitude of stress during film formation is, therefore, crucial to …
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Structure and epitaxy studies of cobalt silicide/silicon heterostructures
… silicide spike formation during CoSi thin film growth, and volumetric contractions during the CoSi $\to$ CoSi$\sb2$ phase transformation. Multilayer Si$\sb{\rm a}$/Co/Si$\sb{\rm c}$ thin film deposition is an effective processing technique for controlling microstructure and preventing …
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Studies of Interfacial Phenomena: Alkanethiol Adsorption and Patterning on Gold and the Superconducting Proximity Effect in Superconductor /Semiconductor Systems
… effects of passivation, dry etching and metal film deposition. Although several Nb/InAs and NbN/InAs samples exhibited evidence of a superconducting proximity effect, additional processing issues must be overcome before a conclusive determination of the excess conduction mechanism can be …
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