Global ETD Search
Search theses and dissertations gathered from participating repositories worldwide. Every result links back to the library that holds it. No account is needed.
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Showing 1 to 6 of 6 for “"Extreme ultraviolet (EUV) lithography"”.
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Fast Large-Scale Electromagnetic Simulation of Doubly Periodic Structures in Layered Media
… in layered media, which can be commonly found in extreme ultraviolet (EUV) lithography, metasurfaces, and frequency selective surfaces. Such problems can be solved by rigorous numerical methods like finite-difference time-domain (FDTD) method and finite element method (FEM). However, FDTD and FEM …
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Time-resolved spectroscopic investigation of N2/H2 nanosecond pulsed discharges and EUV-induced low-temperature plasmas
Extreme ultraviolet (EUV) lithography is central to advanced semiconductor manufacturing, yet the low-density plasmas triggered by EUV photons in scanner-relevant environments remain only partially characterised. Their transient, photon-driven nature complicates invasive diagnostics and makes …
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Progress in coherent lithography using table-top extreme ultraviolet lasers
… This dissertation describes alternative extreme ultraviolet (EUV) lithography techniques which combine table-top EUV laser and various cost-effective imaging strategies. For each technique, numerical simulations, system design, experiment result and its analysis will be presented. In …
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Hydrogen surface wave plasma cleaning of the EUV collector
… are being investigated for the limiting step, lithography, to cut costs and drive innovation. The current industry standard of 193 nm light from an excimer laser has been manipulated through techniques such as multiple pattern or immersion lithography to reduce the wavelength and size of the …
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Surface cleaning of optics by plasma (scope) with atomic hydrogen
A major obstacle in the implementation of extreme ultraviolet (EUV) light photolithography in production tools is the accumulation of fuel debris on the collector optics near the pinch region. Specifically, removal of deposited tin from the source onto the collector optics is needed to improve the …
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Removal of organic contaminants from lithographic materials
… issues still facing the implementation of extreme ultraviolet lithography (EUVL) into mainstream manufacturing for integrated circuit (IC) production is cleanliness. EUV photons at 13.5 nm are easily absorbed by many species, including dust, thin-film layers, and other debris present in the …