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Showing 1 to 20 of 80 for “"Extreme ultraviolet"”.

  1. Extreme ultraviolet probing of laser ablation

    Hobbs, LaurenUniversity of York2011

    This thesis details the use of extreme ultraviolet (EUV) sources in probing laser ablation and material opacity. The radiation hydrodynamic codes POLLUX and h2d are used to study the Rayleigh-Taylor instability in a regime relevant to inertial fusion energy and, in support of experimental effort, …

    whiterose Repository record

  2. Extreme-Ultraviolet Response of Ionic Crystals

    Scheifley, William ClaytonUniversity of Illinois at Urbana-Champaign2015

    Made available in DSpace on 2015-05-12T22:38:57Z (GMT). No. of bitstreams: 2 license.txt: 4848 bytes, checksum: 96035ab3f5e1c23cc7138a224ce498bd (MD5) 7317638.PDF: 3613087 bytes, checksum: 3522e59fbdec1320abd385f4359a980f (MD5) Previous issue date: 1973

    uiuc Repository record

  3. Extreme ultraviolet response of ionic crystals

    Scheifley, William C.2010

    … potassium bromide have been determined in the extreme-ultraviolet by means of transmission measurements on thin films. For this purpose an electron storage ring was used as a source of continuum radiation in the range of photon energy from 70 to 220eV. A careful comparison of experimental and …

    uiuc Repository record

  4. Transient extreme ultraviolet spectroscopy of semiconductors

    Verkamp, Max AndrewUniversity of Illinois at Urbana-Champaign2019

    Transient extreme ultraviolet (XUV) spectroscopy is used to investigate ultrafast photophysics in lead iodide (PbI2) and methylammonium lead iodide perovskite (MAPbI3). Sub-30 fs pulses of XUV light are produced to use as a probe in a tabletop instrument using high-harmonic generation. PbI2 and …

    uiuc Repository record

  5. Extreme Ultraviolet Spectroscopy of the Solar Corona

    Del Zanna, GiulioUniversity of Cenral Lancashire1999

    New Extreme Ultra-Violet (EUV) observations of the solar corona, obtained by the Coronal Diagnostic Spectrometer (CDS) instrument on board the NASA/ESA Solar and Heliospheric Observatory (SOHO) are presented. The CDS instrument for the first time has provided the opportunity of observing a large …

    cent-lancashire Repository record

  6. Extreme Ultraviolet Polarimetry with Laser-Generated High-Order Harmonics

    Brimhall, Nicole2007

    We developed an extreme ultraviolet (EUV) polarimeter, which employs laser-generated high-order harmonics as the light source. This relatively high-flux directional EUV source has available wavelengths between 8 nm and 62 nm and easily rotatable linear polarization. The polarimeter will aid …

    byu Repository record

  7. Investigation of plasma diffusion in extreme ultraviolet lithography sources

    Panici, GianlucaUniversity of Illinois at Urbana-Champaign2020

    DSpace SAF Submission Ingestion Package generated from Vireo submission #14779 on 2020-02-28 at 17:16:36

    uiuc Repository record

  8. Progress in coherent lithography using table-top extreme ultraviolet lasers

    Li, Wei, author, Marconi, Mario C., advisor, Menoni, Carmen S., advisor, Wu, Mingzhong, committee member, Krapf, Diego, committee memberColorado State University. Libraries2016

    … This dissertation describes alternative extreme ultraviolet (EUV) lithography techniques which combine table-top EUV laser and various cost-effective imaging strategies. For each technique, numerical simulations, system design, experiment result and its analysis will be presented. In …

    colostate Repository record

  9. Femtosecond time-resolved photoelectron spectroscopy in the extreme ultraviolet region

    Siffalovic, PeterUniversität Bielefeld

    Eine experimentelle Apparatur für Femtosekunden Pump-Probe-Studien reversibler Prozesse im EUV Bereich wurde aufgebaut. Photoelektronenspektren von Einzelkristallen, Adsorbaten und Gasen wurden gemessen. Die zeitaufgelösten Photoelektronenspektren des Pt(110) Valenzbandes zeigen die ultraschnelle …

    bielefeld Repository record

  10. Extreme ultraviolet polarization optics for polarimetry of structured high harmonics

    Westlake, Nathaniel MorganColorado School of Mines. Arthur Lakes Library2023

    … is a leading way to generate table-top coherent extreme ultraviolet (EUV) and attosecond pulses. Polarization characterization in this spectral range is important to understand the phenomena of HHG and quantify the light used for experiments. Furthermore, polarization control allows for …

    colo-mines Repository record

  11. Magnetic mitigation of energetic ions for extreme ultraviolet lithography sources

    Elg, DanielUniversity of Illinois at Urbana-Champaign2013

    … to avoid this problem. The use of 13.5nm Extreme Ultraviolet (EUV) light for lithography presents a solution. Switching to this wavelength would enable many of the expensive advanced techniques to be abandoned. It would also allow for a smaller resolution without as much reduction in …

    uiuc Repository record

  12. Ultrafast photophysics of organohalide perovskites by transient extreme ultraviolet spectroscopy

    Sharma, AasthaUniversity of Illinois at Urbana-Champaign2022

    Submission published under a 24 month embargo labeled 'U of I Access', the embargo will last until 2024-08-01

    uiuc Repository record

  13. Ultrafast extreme ultraviolet spectroscopy of transition metal dithiolate coordination complexes

    Benke, KristopherUniversity of Illinois at Urbana-Champaign2021

    … near edge structure (XANES) spectroscopy using extreme ultraviolet (XUV) light is used as a tool to interrogate the evolution of the metal center in a series of transition metal dithiolate complexes. The behavior of these molecules after absorption of light has implications for the development …

    uiuc Repository record

  14. Extreme ultraviolet holography for fabrication of high resolution Fresnel zone plates

    Sarkar, Sankha SubhraETH / PSI2010

    ethz Repository record

  15. The transmission characteristics of some optical crystals in the extreme ultraviolet

    McClinton, Arthur ThomasVirginia Tech1966

    … optical crystals were determined for the vacuum ultraviolet using a SeyaNamioka monochromator. The characteristic low wavelength cutoffs were determined for crystals transmitting in the region 1050-2000 A. The crystals so studied are: MgF₂, NaF, LaF₃, SrF₂, BaF₂, BeO, Al₂O₃, KD*P, KDP, ADP, NaCl, …

    vt Repository record

  16. Extreme Ultraviolet Airglow Observations and Applications from the Ionospheric Connection Explorer

    Tuminello, Richard MichaelVirginia Tech2024

    … and above, in part by using observations of ultraviolet airglow, which have long been used as a tool for making remote sensing observations of the upper atmosphere. The Extreme Ultraviolet Spectrometer (EUV) instrument was included on ICON to measure atmospheric airglow between 54 and 88 nm …

    vt Repository record

  17. Interactions of intense optical and extreme-ultraviolet lasers with atoms and solids

    Dardis, JohnDublin City University2009

    … describes the interaction of intense optical and extreme-ultraviolet laser pulses with atoms and solids. The work was divided into two main parts: The first part describes studies on laser-produced plasmas done at the National Centre for Plasma Science and Technology in Dublin City University …

    dcu Repository record

  18. Scandium Oxide Thin Films and Their Optical Properties in the Extreme Ultraviolet

    Acosta, Guillermo Antonio2007

    … scandium oxide thin film was measured in the Extreme Ultraviolet (EUV) from 2.7 to 50 nm (459.3 to 24.8 eV) using synchrotron radiation at the Advanced Light Source Beamline 6.3.2 at the Lawrence Berkeley National Laboratory. In these measurements, a new method for data collection was used, in …

    byu Repository record

  19. Detection of energetic neutral flux emanating from extreme ultraviolet light lithography sources

    Sporre, John R.University of Illinois at Urbana-Champaign2010

    … for the next generation of lithography is extreme ultraviolet light lithography (EUVL) technology. This technique improves upon currently used excimer laser lithography by reducing the light source wavelength from 195nm down to a 13.5nm ± 0.2 nm. This shift allows for an increase in …

    uiuc Repository record

  20. Extreme ultraviolet spectra of highly ionized titanium, vanadium, chromium, manganese, and iron

    Weissberg, Samuel GeorgeUniversity of Illinois Urbana-Champaign1936

    uiuc Repository record

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