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Showing 1 to 1 of 1 for “"Extreme Ultraviolet (EUV) source"”.
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Cleaning of tin debris by reactive ion etching in a discharge-produced EUV plasma source
Extreme ultraviolet lithography (EUVL) is a promising candidate for the next generation of lithography technique to continue Moore's law. Moore's law has been upheld by shrinking the feature size on devices and driving the development of faster and denser integrated chips. The short wavelength …