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Showing 1 to 3 of 3 for “"Etch chemistry"”.
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Domain engineering techniques and devices in lithium niobate
… device applications. <br/><br/>Experimental etch-rate measurements from a parametric study of etch-rates and etch-quality of single-crystal lithium niobate z-faces, as a function of specific ratios for mixtures of HF/HNO<sub>3</sub>, to ascertain whether the widely-employed 1:2 mixture was in …
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Mechanism of fluoride-based etch and clean processes
Fluoride-containing solutions are widely used to etch silicon dioxide-based films. A critical issue in integrated circuit (IC) and microelectromechanical systems (MEMS) fabrication is achievement of adequate selectivity during the etching of different film materials when they are present in …
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Laser-enhanced plasma etching of semiconductor materials
… work, laser exposure was coupled with plasma etch processes for local etch rate enhancement, and under some conditions, etch activation. Materials were tested which are most-frequently used in semiconductor devices – namely Si, SiO2, and Cu. A 100 Hz, 7 ns pulse width Q-switched Nd:YAG laser …