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Showing 1 to 4 of 4 for “"Electronbeam"”.

  1. Low-voltage spatial-phase-locked scanning-electron-beam lithography

    … (HSQ) and polymethyl methacrylate (PMMA). Unlike electronbeam lithography at higher voltages, LVEBL has minimal proximity effects and is not resolution-limited by these effects. The fabrication of ultra-thin photoresist grids is investigated and the secondary electron signal levels of these grids …

    mit Repository record for Low-voltage spatial-phase-locked scanning-electron-beam lithography (opens in a new tab)

  2. Accurate nanofabrication techniques for high-index-contrast microphotonic devices

    … fabrication is based on direct-write scanning-electronbeam lithography. A sidewall-roughness characterization and optimization scheme is developed as is the first three-dimensional analysis of scattering losses due to sidewall roughness. Writing strategy in scanning-electron-beam lithography …

    mit Repository record for Accurate nanofabrication techniques for high-index-contrast microphotonic devices (opens in a new tab)

  3. Design-technology co-optimization in next generation lithography

    … system (e.g. extreme ultraviolet lithography, electronbeam, directed self-assembly) • new simulation and verification approach (e.g. process windows optical proximity correction, parallel simulation) Corresponding to these four research directions, in this dissertation, we propose our research …

    uiuc Repository record for Design-technology co-optimization in next generation lithography (opens in a new tab)

  4. Rheological and Mechanical behaviour of Block copolymers, Multigraft copolymers and Block copolymer Nanocomposites

    Block copolymers are commercially significant and fundamentally interesting class of polymeric materials. The ability to undergo interfacial thermodynamics-controlled microphase separation from a completely disordered state in the melt to a specifically defined ordered structure through …

    qucosa-diss