Global ETD Search
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Showing 1 to 20 of 25 for “"Electron Beam Lithography (EBL)"”.
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Sub-10-nm electron-beam lithography for templated placement of colloidal quantum dots
… the investigation of resolution limits of electron-beam lithography (EBL) at the sub-10-nm scale. EBL patterning was investigated at low electron energy (2 keV) in a converted scanning electron microscope and at high electron energy (200 keV) in an aberration-corrected scanning transmission …
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In-situ Scanning Electron Microscopy for Electron-beam Lithography and In-situ One Dimensional Nano Materials Characterization
In this thesis, we demonstrate in-situ scanning electron microscopy techniques for both electron beam lithography (EBL) and in-situ one dimensional nano materials electrical characterization. A precise voltage contrast image positioning for in-situ EBL to integrate nanowires into suspended …
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Three-dimensional nanofabrication by electron-beam lithography and directed self-assembly
… three-dimensional (3D) nanofabrication using electron-beam lithography (EBL), block copolymer (BCP) self-assembly, and capillary force-induced self-assembly. We first developed new processes for fabricating 3D nanostructures using a hydrogen silsesquioxane (HSQ) and poly(methylmeth-acrylate) …
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High fidelity pattern transfer in InP photonic device fabrication
… these tolerances are easily achieved using lithography technology such as electron beam lithography (EBL) or 193 nm projection, neither are viable optical options for InP production.[2] The purpose of this thesis is to develop a fabrication process for InP Faraday rotators using standard, …
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Polynomial time optimal algorithm for stencil row planning in e-beam lithography
Electron beam lithography (EBL) is a very promising candidate for integrated circuit (IC) fabrication beyond the 10 nm technology node. To address its throughput issue, the Character Projection (CP) technique has been proposed, and its stencil planning can be optimized with awareness of overlapping …
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Nanolithography and Nanofabrication Using Hydrogen Silsesquioxane Resists
… structures with high precision and electron-beam lithography (EBL) has been widely used for this purpose. Hydrogen silsesquioxane (HSQ) has received much attention as a new class of negative-tone electron-beam resist. Due to its high resolution and excellent etch resistance, HSQ …
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Real-time spatial-phase-locked electron-beam lithography
The ability of electron-beam lithography (EBL) to create sub-10-nm features with arbitrary geometry makes it a critical tool in many important applications in nanoscale science and technology. The conventional EBL system is limited by its poor absolute-placement accuracy, often worse than its …
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Hydrogen silsesquioxane (HSQ) for use in nano imprint lithography
… feature production. Current methods such as electron beam lithography (EBL), Extreme Ultra-Violet Lithography (EUV), and Nano-imprint lithography (NIL) are currently being studied to deliver a high throughput, low-cost process, and high field size for nano-lithography. EBL is a technique …
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Electron beam lithography for nano-antenna fabrication
Lithography methods have been used for patterning of small features for decades; in this research project, I examined Electron Beam Lithography (EBL) for fabrication of nano-antennas and then parameterized EBL variables to improve patterning. I overcame difficulties in some steps of this method to …
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Superconducting nanowire single-photon detectors and sub-10-nm lithography
… we investigated the resolution performance of electron-beam lithography (EBL) by first improving the contrast performance of hydrogen silsesquioxane (HSQ) negative-tone resist. The contrast of HSQ was improved by adding NaCl salt to an aqueous NaOH developer solution. With this improvement, we …
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Electron-beam lithography towards the atomic scale and applications to nano-optics
Electron-beam lithography (EBL) is a high-resolution pattern generation technique widely used in research and development. However, EBL resolution has been limited to 4 nm isolated features and 16 nm periodic structures. Furthermore, the physical mechanisms that limit EBL resolution are not …
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Concentric Microresonators Design For Dispersion Engineering and Scalable Electron-Beam Lithography for Si and SiN Photonic Platforms
… On the fabrication side, a robust subtractive electron-beam lithography (EBL) process is established for the silicon-on-insulator (SOI) platform, enabling reliable pattern transfer from sub-50 nm to micrometer-scale structures. Using this process, corrugated Bragg gratings for optical filtering …
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Surface-enhanced Raman scattering of metal nanoparticle assembly in agarose and highly ordered metal nanorod arrays
… however depended on time-consuming and expensive electron beam lithography (EBL) to write a template to guide nucleation and the subsequent growth of nanorods. Importantly, lengthy fabrication times force a practical upper size limit on the substrate, meaning it is exceedingly small which …
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Nanoscale investigation of silk proteins using near-field optics
… of applications from biomedical devices, optics, electronics, to transient implants. Understanding the mechanisms that underpin the β-sheet formation and deformation as well as the formulation of strategies to control inter- and intramolecular bonds within silk protein matrices is paramount for …
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Split Ring Resonator (SRR) based metamaterials
… on silicon and silica substrates using standard electron beam lithography (EBL) techniques. The effect of different metals (Al and Au) on the resonance of SRRs is studied. A substantial shift is reported, in the response of arrays of similarly sized SRRs, made respectively of aluminium and of …
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Template Directed Growth of Nb doped SrTiO₃ using Pulsed Laser Deposition
… techniques for testing and eventual use. Electron Beam Lithography (EBL) was used to pattern poly-methyl-methacrylate (PMMA) resists on undoped single crystalline SrTiO₃ (STO) substrates which were then filled with Nb:STO using Pulsed Laser Deposition (PLD) at room temperature. This …
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Integrated plasmonic nano-antenna devices
… find application in future generations of opto-electronic devices. An example of a plasmonic device is a nano-antenna. Although nano-antennas are applied in biological sensing, imaging and nano-particle manipulations, they are passive devices that must be driven by an external source. As …
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Design, fabrication, and characterization of magnetic nanostructures
… of tomorrow.<br/>In this thesis, the use of electron beam lithography (EBL) and a bilayer liftoff process to fabricate magnetic Ni nanostructures with constrictions in the range of 12 to 60 nm is reported. These structures were fabricated based upon the constricted nanowire (CNW) and …
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Additive-Assisted Nucleation and Growth of Thin Films: Controlled Experiments and Multiscale Simulations
An electron-beam-lithography (EBL) method was used to fabricate a region of uniformly repeated surface features of Cu on a Au film. Experiments were performed to evaluate how the (1) additives, (2) applied potential, and (3) seed spacing affect the trade-off between seed cluster growth and wild …
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Micro- and nano-electrode arrays for electroanalytical sensing
… of nanoelectrode arrays were fabricated using electron-beam lithography (EBL). The voltammograms obtained from these arrays exhibited a continual increase in the recorded peak current as the individual electrodes radius was decreased to a value of 110 nm. Since EBL is a slow and costly …
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