Global ETD Search
Search theses and dissertations gathered from participating repositories worldwide. Every result links back to the library that holds it. No account is needed.
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Showing 1 to 6 of 6 for “"EUV-radiation"”.
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Auslegung und Charakterisierung eines Extrem-Ultraviolett-Transmissionsmikroskops
… the utilization of extreme ultraviolet (EUV) radiation is currently taken into consideration world-wide. Because of the short wavelengths and the high element specific absorption of EUV-radiation microscopic analyses of physical structures in the order of less than 10 nm and thicknesses …
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Interactions of intense optical and extreme-ultraviolet lasers with atoms and solids
… second part describes the interaction of intense EUV radiation with atoms, performed at the free-electron laser in Hamburg. When an intense optical laser impinges on a solid metal surface a high density, high temperature plasma is produced. If two such plasmas are produced within close proximity …
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Protoplanetary disc evolution and dispersal
… this work, only photoevaporation from a pure EUV radiation field was described within a hydrodynamic framework. Therefore, I start by building a hydrodynamic solution to the pure X-ray photoevaporation problem, and then extend this solution to the entire high energy spectrum. This hydrodynamic …
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Theoretical and Experimental Studies of Radiation from Z-Pinch Complex Wire Arrays and Applications
… which have been shown to be very powerful radiation sources, arranged in single, double, and triple wire array configurations were tested with Mo and Ag materials, which have both been shown to be powerful radiators, and also mixed with Al to understand opacity effects and how a mixture of …
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Two photon and two colour ionization of atoms in intense extreme-UV and optical laser fields
… infrared laser systems. The advent of intense EUV and X-ray Free Electron Lasers (FELs), based on the principle of Self Amplifed Spontaneous Emission (SASE), has enabled the study of multiphoton ionization of inner shell electrons for the first time. Results on the interaction of intense and …
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Debris Characterization And Mitigation Of Droplet Laser Plasma Sources For Euv Lithography
Extreme ultraviolet lithography (EUVL) is a next generation lithographic techniques under development for fabricating semiconductor devices with feature sizes smaller than 32 nm. The optics to be used in the EUVL steppers is reflective optics with multilayer mirror coatings on each surface. The …