Global ETD Search
Search theses and dissertations gathered from participating repositories worldwide. Every result links back to the library that holds it. No account is needed.
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Showing 1 to 10 of 10 for “"ECR plasma"”.
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Radial ion transport in a limited axisymmetric ECR plasma
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Physics, 1995.
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Numerical modeling of electron cyclotron resonance plasma
… is introducing electron cyclotron resonance (ECR) plasma reactors as reliable wafer etching tools. This industry requires radially uniform etching rate and radially uniform etching anisotropy. The etching rate and etching anisotropy depend on the ECR plasma properties.
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Preparation and characterisation of magnetic single and double barrier junctions
… biased MTJs, the tunnel barrier formation by ECR plasma oxidation, the (annealing) temperature dependence, noise in MTJs and spin polarisation of ferromagnetic double layer electrodes. The second experimental chapter investigates MTJs with two tunnel barriers.
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Modeling of gallium nitride molecular beam epitaxy growth
… beam epitaxy growth of GaN using ammonia and ECR plasma source. A surface riding layer of Ga and ammonia or N plasma species are included in the model. The surface riding species are allowed to undergo several physical and chemical processes. Rates of all surface processes are assumed …
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Advancement of liquid lithium plasma-facing components for next-generation fusion devices
… of these challenges is handling the large heat, plasma and neutron fluxes exhausted from the core plasma. Current tokamak design points assume a steady state heat flux of 10MW/m2 increasing to values >1GW/m2 in transient events and particle fluxes > 1 × 1023m−2s−1. Flowing liquid lithium Plasma …
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Low temperature epitaxial silicon growth using electron cyclotron resonance plasma deposition
… used. We have used electron cyclotron resonance (ECR) plasma deposition to grow high quality epitaxial silicon films on silicon wafers. This growth technique relies on the deposition of silicon from a highly energetic hydrogen and silane plasma. The presence of the hydrogen in the plasma provides …
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Process-Induced Degradation during the Integration of Pb(Zr/x Ti/1-x)O3 Ferroelectric Capacitors
… capacitor module requires high density plasma to pattern their shapes because of a low volatility of etched byproducts, therefore the degradation of ferroelectric capacitor performance could occur by the collision of high energetic particles. The damage of PZT thin film due to dry …
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Energetic Deposition of Niobium Thin Film in Vacuum
… uses microwave power to create a pure niobium plasma, which can be used to extract niobium ion flux with controllable kinetic energy for direct deposition. The ultra high vacuum avoids the gaseous inclusions in thin films. A retarding field energy analyzer is developed and used to measure the …
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Studio sperimentale di plasmi ECR in regimi stazionari e turbolenti mediante un sistema multidiagnostico: prospettive per investigare i decadimenti beta di interesse nucleare e astrofisico in plasma
… termodinamiche dell'ambiente, ovvero un plasma magnetizzato (riscaldato tramite Electron Cyclotron Resonance (ECR)) confinato da intensi campi magnetici. Le attività sperimentali, condotte presso i INFN-LNS e in collaborazione con i Laboratori ATOMKI, riguardano in particolare lo studio, …
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Modellazione della rapidita di decadimento β nel plasma: studio teorico di PANDORA
… ioniche a risonanza ciclotronica elettronica (ECRIS) sono dispositivi versatili per fornire acceleratori con fasci ionici altamente carichi. Si basano sul duplice concetto di confinamento magnetico mediante profilo B minimo e riscaldamento per risonanza mediante accoppiamento con microonde. I …