Global ETD Search
Search theses and dissertations gathered from participating repositories worldwide. Every result links back to the library that holds it. No account is needed.
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Showing 1 to 20 of 30 for “"E-Beam Lithography"”.
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Polynomial time optimal algorithm for stencil row planning in e-beam lithography
Electron beam lithography (EBL) is a very promising candidate for integrated circuit (IC) fabrication beyond the 10 nm technology node. To address its throughput issue, the Character Projection (CP) technique has been proposed, and its stencil planning can be optimized with awareness of overlapping …
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Pattern-placement-error detection for spatial-phase-locked e-beam lithography (SPLEBL)
Spatial-phase-locked electron-beam lithography (SPLEBL) is a new paradigm for scanning electron-beam lithography (SEBL) that permits nanometer-level pattern placement accuracy. Unlike conventional SEBL systems which run in an open-loop fashion, SPLEBL uses continuous feedback to directly monitor …
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Fabrication and applications of in-fiber semiconductor and metal microspheres
… approaches, such as through ball milling or e-beam lithography, or via bottom-up approaches, such as colloidal chemistry. Top-down approaches often generate a wide particle size distribution, while bottom up approaches often involve toxic and sometimes rather expensive precursors to generate …
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Nanometer-scale placement in electron-beam lithography
Electron-beam lithography is capable of high-resolution lithographic pattern generation (down to 10 nm or below). However, for conventional e-beam lithography, pattern-placement accuracy is inferior to resolution. Despite significant efforts to improve pattern placement, a limit is being …
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Electrical and optical properties of carbon nanotube intra-connects and conductive polymers
… with sharp end on a silicon wafer using e-beam lithography. The intra-connects were then grown by use of chemical vapor deposition (CVD) technique. The intra-connects were later electroplated by various conductive polymers. The morphology, electrical conductivity of these intra-connects as …
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Synthesis and Characterization of Nanostructures in Porous Anodic Aluminum Oxide Templates
… in the templates by electrodeposition. By using lithography techniques, controlled patterned nanostructures were also fabricated on alumina templates. The magnetic properties of the various metal nanostructures were investigated. The pore size, interpore distance, and pore geometry highly affect …
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Zone plate array lithography in the deep UV
… design and development of a new paradigm in nanolithography, zone plate array lithography (ZPAL), has yielded a clearer understanding of its operation, construction, and performance. The benefits of ZPAL as a maskless strategy to write arbitrary patterns with ~ 25 nm resolution are explored. To …
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Optical rectification in semiconductor waveguides
… device was fabricated using conventional photolithography techniques and e-beam lithography techniques. The advantages of e-beam lithography are: better pattern definition, perfect alignment and easier lift-off process. The only disadvantage is the cost associated with running the e-beam writer …
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The Application Of Graphene Films In Biosensing And Electrowetting
… fully investigated yet. We propose to combine e-beam lithography (EBL) and dry etching to generate edge defects for biosensor application. These edge defects not only enhance sensitivity but also control the binding sites for surface functionalization. We also demonstrate, for the first time, a …
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Design and characterization of Si/SiGe heterostructure sub-100 nm bulk p-MOSFET
… source/drain and fully silicided (FUSI) gate. E-beam lithography is used for patterning nano scale gate with hydrogen silsequioxane (HSQ) e-beam resist and proper cleaning process for CMOS process compatibility. Extraction of carrier transport parameters for deep submicron devices will be also …
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Design and fabrication of nanostructures for thermal conductivity measurements and picosecond acoustics
… coefficient and electrical conductivity. E-beam lithography and optical lithography with oxygen plasma etching are used to pattern sub-micron patterning and TMAH wet etching and XeF2 etching are used to release the structures to free standing. Last, fabrication of metallic gratings is …
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Economic potential of high density data storage implemented by patterned magnetic media technology
… bit. The basic fabrication approach is to use lithography to pattern the magnetic materials on the platter. However, patterned media requires well-ordered nanoarrays with dimensions less than 25 nm, which challenges the state-of-art lithography technologies. This M. Eng. project focuses on …
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Block copolymer self-assembly : lithography, magnetic fabrication, and optimization
… in semiconductor fabrication since current photolithography has reached its resolution limitation and the other competing technologies are either too slow such as e-beam lithography or too expensive such as EUV system. In this thesis, BCP lithography is utilized to fabricate magnetic …
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Low-Temperature Germanium Waveguides for Mid-Infrared Sensing Applications
… (LT) Ge-on-Si waveguides using direct write lithography. Waveguide dimensions for optimal confinement in single-mode transverse electric (TE) polarization at wavelengths of 3 µm and 10.4- 11.3 µm were modeled and the direct lithography process was refined. Through dose testing and adjustments …
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Magnetic domain formation in La1-xSrxMnO3 nanowires studied with resonant soft x-ray scattering
… tall, 80nm wide from LSMO thin films using e-beam lithography. Magnetization measurements performed on these wires showed an anomalous increase in the magnetization at temperatures far below the Curie point of the bulk material. Around this temperature, coexisting phase separated domains were …
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Studies on Optically Induced DC-Voltage in Thin Film Structures
… procedures: electrochemical deposition and e-beam lithography.
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Transport spectroscopy of graphene quantum dots fabricated by atomic force microscope nano-lithography
… in graphene, known as Atomic Force Microscope Lithography (AFML). We then use AFML to fabricate graphene quantum dot systems. Transport measurements are carried out on our graphene quantum dots at low temperatures and high parallel magnetic fields and we try to understand the behaviour of spins …
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Development of nanoscale biosensors for cancer related proteases and blood-borne pathogens based on electrochemical and optical methods
… The well-defined regular VACNF NEAs by e-beam lithography show a much faster kinetics for cathepsin B proteolysis. This EC method was further applied in whole lysate of human breast tissue and breast cells. The detected protease activity was found increased in cancer cells, with the …
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Environmentally focused patterning and processing of polymer thin films by initiated chemical vapor deposition (iCVD) and oxidative chemical vapor deposition (oCVD)
… in the entire integration process, including lithography. Colloidal lithography was combined with iCVD and capillary force lithography to create spatially addressable grafted polymer pattern nanostructures, without the need for expensive lithography tools. Using this method, we pattern our …
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An investigation into the aggregation of therapeutic peptides through adsorption to primary containers
… relationship than previously thought. E- beam lithography was then used to create different nanostructures on the gold surface. Ultimately, the thesis aimed at tackling a large problem within the pharmaceutical industry, by providing alternative pathways to challenge the problem of …
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