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Search theses and dissertations gathered from participating repositories worldwide. Every result links back to the library that holds it. No account is needed.
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Showing 1 to 16 of 16 for “"Directed Self-Assembly (DSA)"”.
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Insertion of metal oxides into block copolymer nanopatterns as robust etch masks for nanolithography
Directed self-assembly (DSA) of block copolymers (BCPs) is a prime candidate to further extend dimensional scaling of silicon integrated circuit features for the nanoelectronic industry. Top-down optical techniques employed for photoresist patterning are predicted to reach an endpoint due to …
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Block copolymer self-assembly - a computational approach towards novel morphologies
Spontaneous self-assembly of materials is a phenomenon exhibited by different molecular systems. Among many, Block copolymers (BCPs) proved to be particularly interesting due to their ability to microphase separate into periodic domains. Nonetheless, the rising need for arbitrary, complex, 3D …
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Coarse grained molecular dynamic of block copolymer directed self assembly on topographic substrate
Directed self-assembly (DSA) of block copolymer (BCP) is a promising and economic method of manufacturing periodic lamellar patterns on wafer that is widely used in semi-conductor and electronic fields. In BCP DSA lithography, same as issues in achieving defective free patterns and smooth edges, an …
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Directed self-assembly of block copolymers with functional materials : a study of nanocomposite thin film fabrication on graphoepitaxial templates
… consequently a variety of highly controllable self-assembly patterns. Directed self-assembly (DSA) of BCPs has therefore emerged as one of the most promising technologies to fabricate functional nanostructures and is able to produce patterns with ultra-small resolution (sub-10 nm) while …
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Design automation algorithms for advanced lithography
… (EUV), electron beam lithography (EBL) and directed self-assembly (DSA). While these new technologies create enormous opportunities, they also pose great design challenges due to their unique process characteristics and stringent constraints. In order to smoothly adopt these advanced …
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Multi-frequency Ultrasound Directed Self-assembly
Ultrasound directed self-assembly (DSA) relies on the acoustic radiation force associated with a standing ultrasound wave to organize particles dispersed in a fluid medium into specific patterns. State-of-the-art ultrasound DSA methods can only organize particles into (quasi-)periodic patterns, …
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Modeling and theoretical design methods for directed self-assembly of thin film block copolymer systems
… applications due to their ability to self-assemble into complex periodic patterns with feature resolutions ranging from a few to 100s nm. BCPs form a wide variety of patterns due the combination of their enthalpic interactions promoting immiscibility between the blocks and the bonding …
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Investigation into obstacles to the implementation of the directed-self assembly of block copolymers
… have been suggested. Among these options is the directed self-assembly (DSA) of block copolymers (BCPs) which have the ability to microphase separate into features with spacings as low as sub-10 nm. The DSA of these features are typically achieved by graphoepitaxy or chemoepitaxy which use either …
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Algorithms for DFM in electronic design automation
… electron beam (E-beam), and block copolymer directed self-assembly (DSA); however, DFM algorithms are essential for them to achieve better printability of a design. In this dissertation, we focus on analyzing the compatibility of designs and various advanced lithography techniques, and …
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Design of silicon-containing block copolymer materials for applications in lithography
… the leading potential methods is to exploit the self-assembly of block copolymers (BCPs). BCPs are a type of polymer consisting of two or more chemically distinct blocks that are covalently joined together. The components of a BCP can phase-separate, and the resultant features form on the 5 to 50 …
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Template-based control for bottom-up nanostructures - multilayer block copolymer graphoepitaxy and masked ZnO nanowire growth
Directed self-assembly (DSA) mutually benefits both bottom-up growth and top-down nanofabrication. This thesis investigates templated control over the alignment and morphology of two bottom-up nanostructures, ZnO nanowires (NWs) and cylinder-forming block copolymers (BCPs). Despite material …
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Chemical vapor deposition of functional and conformal polymer thin films for the formation and modification of nanostructures
… the formation of nanostructures for ICs via the directed self-assembly (DSA) of block copolymers (BCPs). Initiated CVD (iCVD) is used to form cross-linked poly(divinyl benzene) (pDVB) films that control the orientation of self-assembled BCPs. The cross-linking mechanism of pDVB is first …
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Mesoscale simulation of block copolymer phase separation and directed self-assembly processes: Applications for semiconductor manufacturing
… (BCP) model was developed and used to studied directed self-assembly (DSA), especially in regards to applications for semiconductor manufacturing. Most of the thesis is spent investigating the effect that guiding layer properties and block copolymer properties have on line roughness and defect …
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Experimental and numerical investigation of steady-state and transient ultrasound directed self-assembly of spherical particles in a viscous medium
Ultrasound directed self-assembly (DSA) utilizes the acoustic radiation force associated with a standing ultrasound wave field to organize particles dispersed in a fluid medium into specific patterns. The ability to tailor the organization and packing density of spherical particles using ultrasound …
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Layout decomposition for triple patterning lithography
… E-beam direct write}, and {\em block copolymer directed self-assembly} (DSA). However, the source power for EUV is still an unresolved issue. The low throughput of E-beam makes it impractical for massive productions. DSA is still under calibration in research labs and is not ready for massive …
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Optimization for advanced lithography
… transistors, electron beam lithography (EBL), self-aligned double patterning (SADP) lithography, directed self-assembly (DSA), extreme ultraviolet lithography (EUVL), etc. Each of the advanced lithography techniques has its own advantages over others, but also faces great challenges due to …