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Showing 1 to 20 of 94 for “"Dielectric materials"”.

  1. Polymer Composite Dielectric Materials For Pulse Power Applications

    … fillers such as barium titanate (BT) for dielectric applications will be discussed. The strategy to overcome the poor filler-polymer interactions that form the core of issue in polymer composites is to surface-modify the filler materials. The attempt by our collaborators at Department of …

    south-carolina Repository record for Polymer Composite Dielectric Materials For Pulse Power Applications (opens in a new tab)

  2. Failure mechanisms of dielectric materials for electric motors

    Submission published under a 24 month embargo labeled 'Closed Access', the embargo will last until 2023-12-01

    uiuc Repository record for Failure mechanisms of dielectric materials for electric motors (opens in a new tab)

  3. Characterizing dielectric materials with a feedback-based model

    … no industry standard for separating the dielectric and conductor losses that appear in PCBs. As part of the thesis work, test vehicles composed of six different dielectric materials were fabricated with different trace widths, copper foil profiles, and oxide surface treatments. A …

    mit Repository record for Characterizing dielectric materials with a feedback-based model (opens in a new tab)

  4. Preparation of Polymer Composites As Dielectric Materials For Capacitors

    <p>Polymer composites with the well-dispersed dielectric ceramic powders as fillers have exhibited enhanced dielectric properties compared to the neat polymers. Polyvinylidene fluoride (PVDF) based ferroelectric polymers are mainly used for energy storage. And CaCu3Ti4O12 (CCTO) is still a novel …

    south-carolina Repository record for Preparation of Polymer Composites As Dielectric Materials For Capacitors (opens in a new tab)

  5. Dielectric materials by Atomic Layer Deposition for microelectronic applications

    … is an innovative technique to deposit thin film materials for several application fields. The rapid affirmation of the ALD process is related to the peculiarities of the deposition mechanism. In particular, because of the self-limiting principle and of the layer-by-layer growth mode, ALD …

    catania Repository record for Dielectric materials by Atomic Layer Deposition for microelectronic applications (opens in a new tab)

  6. Wideband electrical characterization of multilayer low-loss dielectric materials

    … work on wideband characterization of the complex dielectric constant of low-loss dielectric materials used in multilayer structures. The materials include Pyralux®, a polymer, and Green Tape™, a low-temperature co-fireable tape ceramic (LTCC). The study is composed of three main tasks. First, the …

    vt Repository record for Wideband electrical characterization of multilayer low-loss dielectric materials (opens in a new tab)

  7. Dynamic tunability enhancement of reflectarray antenna using non-homogeneous dielectric materials

    … based on non-homogeneous properties of substrate materials has been introduced. This research study provides a thorough investigation on the tunability performance of reflectarrays designed in X-band frequency range. The objective of this work is to demonstrate the functionality of an active …

    uthm Repository record for Dynamic tunability enhancement of reflectarray antenna using non-homogeneous dielectric materials (opens in a new tab)

  8. Physical understanding and modeling of chemical mechanical planarization in dielectric materials

    … fabrication processes. This work studies CMP in dielectric materials in particular, which is widely used in device formation for isolation and in interconnect formation for dielectric planarization. The physical understanding of the process is essential for CMP tool engineers to design optimal …

    mit Repository record for Physical understanding and modeling of chemical mechanical planarization in dielectric materials (opens in a new tab)

  9. ULTRA-LOW K DIELECTRIC MATERIALS WITH HIGH BREAKDOWN STRENGTH AND EXCELLENT MECHANICAL PROPERTIES

    … there is an ever-existing need to have better materials research for semiconductors. It was estimated by Gordo Moore that the number of transistors that can be fabricated on a chip would double every 18 months, and the focus of every researcher in this domain has remained to meet the projected …

    houston Repository record for ULTRA-LOW K DIELECTRIC MATERIALS WITH HIGH BREAKDOWN STRENGTH AND EXCELLENT MECHANICAL PROPERTIES (opens in a new tab)

  10. Etching kinetics and surface roughening of polysilicon and dielectric materials in inductively coupled plasma beams

    … the back end, feature sidewall roughness of the dielectric materials might degrade the resolution of contacts, interfere with the deposition of conformal liner materials, and make the process integration challengeable. In an inductively coupled plasma apparatus, the etching behavior on real …

    mit Repository record for Etching kinetics and surface roughening of polysilicon and dielectric materials in inductively coupled plasma beams (opens in a new tab)

  11. A study of high-K dielectric materials in conjunction with a multilayer thick-film system

    A new family of dielectric materials has been studied, individually as thick-film capacitors and as buried components incorporated in second-order lowpass and bandpass RC active filter circuits. The materials were electrically characterized in terms of the variation of dielectric constant and …

    vt Repository record for A study of high-K dielectric materials in conjunction with a multilayer thick-film system (opens in a new tab)

  12. Surface and interface characterisation of high-k dielectric materials on silicon and III-V semiconductor substrates

    Interface formation between high-k dielectric oxide materials and semiconductor surfaces is of critical importance to the development of the next generation of high speed semiconductor devices. This thesis investigates the deposition and characterisation of a range of candidate high-k materials on …

    dcu Repository record for Surface and interface characterisation of high-k dielectric materials on silicon and III-V semiconductor substrates (opens in a new tab)

  13. Study of Interactions Between Diffusion Barrier Layers and Low-k Dielectric Materials for Copper/Low-k Integration

    … of diffusion barrier/adhesion promoter materials that provide excellent performance in preventing the diffusion and intermixing of Cu into the adjacent dielectrics. The integration of Cu with low-k materials may decrease RC delays in signal propagation but pose additional problems …

    unt Repository record for Study of Interactions Between Diffusion Barrier Layers and Low-k Dielectric Materials for Copper/Low-k Integration (opens in a new tab)

  14. A Coupled Heat Transfer and Electromagnetic Model for Simulating Microwave Heating of Thin Dielectric Materials in a Resonant Cavity

    … microwave applicators for heating industrial materials with temperature-dependent properties is challenging, and trial-and-error system prototyping is an expensive and wasteful means to accomplish this goal. The purpose of this work is to combine existing heat transfer and electromagnetic …

    vt Repository record for A Coupled Heat Transfer and Electromagnetic Model for Simulating Microwave Heating of Thin Dielectric Materials in a Resonant Cavity (opens in a new tab)

  15. Impact of Chemical States on the Effective Work Function of Metal Gate and High-kappa Dielectric Materials on Novel Heterostructures

    … oxidation effects of the alternate channel materials. The extracted work function of TiN with various thicknesses on HfSiO is found to be in agreement with that of TiN on a silicon substrate. X-ray and ultraviolet photoelectron spectroscopy are used to observe the interface electronic states …

    tdl Repository record for Impact of Chemical States on the Effective Work Function of Metal Gate and High-kappa Dielectric Materials on Novel Heterostructures (opens in a new tab)

  16. Dielectric characterization using a Wideband Dielectric Filled Cavity (WDFC)

    … sample configurations used for characterizing dielectric materials over a wide band of frequencies. In the two configurations, a cylindrical cavity completely filled with a sample of the dielectric material of interest is used. The two configurations are the following: 1. The cylindrical cavity …

    vt Repository record for Dielectric characterization using a Wideband Dielectric Filled Cavity (WDFC) (opens in a new tab)

  17. Investigation Of High-k Gate Dielectrics And Metals For Mosfet Devices.

    … deposition techniques have made feasible high- k dielectric materials for MOS transistors. The continued scaling of CMOS devices is pushing the Si-SiO2 to its limit to consider high-k gate dielectrics. The demand for faster, low power, smaller, less expensive devices with good functionality and …

    ucf

  18. Flux growth, characterization, and structure-property relations for inorganic oxide crystals: Lithium triborate, potassium titanyl phosphate and lead titanate

    … of three different types of inorganic nonlinear dielectric materials, namely, lithium triborate (LBO), lead titanate (PT), and potassium titanyl phosphate (KTP). The electrical and optical properties were determined and related to their structural features and crystal perfection. Manipulation of …

    uiuc Repository record for Flux growth, characterization, and structure-property relations for inorganic oxide crystals: Lithium triborate, potassium titanyl phosphate and lead titanate (opens in a new tab)

  19. Pulsed-plasma chemical vapor deposition of organosilicon thin films for dielectric applications

    … is facing the increasing challenge of finding materials that can meet the stringent demands of the next generation of devices. One of the most intense, as well as diverse, fields of research has been in the area of low-k and ultralow-k dielectric materials. Dielectric materials play a key role …

    mit Repository record for Pulsed-plasma chemical vapor deposition of organosilicon thin films for dielectric applications (opens in a new tab)

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