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Showing 1 to 20 of 310 for “"Dielectric constant"”.

  1. The dielectric constant of liquid ammonia

    Thesis (M.A.)--University of Kansas, Chemistry, 1917. ; Includes bibliographical references.

    ku Repository record for The dielectric constant of liquid ammonia (opens in a new tab)

  2. Online microwave measurement of complex dielectric constant

    … the problem of on-line measurement of complex dielectric constant for the purpose of dielectric discrimination or product evaluation using microwave techniques. Various methods of signal/sample interaction were studied and consideration was given to the problem of sorting irregularly shaped …

    cape-town Repository record for Online microwave measurement of complex dielectric constant (opens in a new tab)

  3. Electrical conductivity of low dielectric constant liquids.

    Thesis. 1975. M.S.--Massachusetts Institute of Technology. Dept. of Chemical Engineering.

    mit Repository record for Electrical conductivity of low dielectric constant liquids. (opens in a new tab)

  4. Determining the Preston constants of low-dielectric-constant polymers

    … by CMP can be determined once its Preston constant is known. The objectives of this work were to develop a method to determine the Preston constants and to measure the Preston constants of four low-dielectric-constant (low-k) polymers, labeled A, B, C, and D, and Cu. A weight-loss method, …

    mit Repository record for Determining the Preston constants of low-dielectric-constant polymers (opens in a new tab)

  5. Spectroscopic characterisation of high dielectric constant materials on semiconducting surfaces

    … of the accumulation capacitance of GaAs high dielectric constant (high-κ) MOS devices by the use of a passivating silicon interfacial layer has been investigated. It has typically been assumed that this affect is due to a high interface state density and associated Fermi level pinning which is …

    dcu Repository record for Spectroscopic characterisation of high dielectric constant materials on semiconducting surfaces (opens in a new tab)

  6. Novel Low Dielectric Constant Thin Film Materials by Chemical Vapor Deposition

    … not fall within a 90% confidence level. A low dielectric constant polymer, poly(tetrafluoro-p-xylylene) (VT-4), was synthesized by chemical vapor deposition from 4,5,7,8,12,13,15,16-octafluoro-[2.2]-paracyclophane (DVT-4). The main motivation was to find a cheaper alternative to poly( alpha, …

    vt Repository record for Novel Low Dielectric Constant Thin Film Materials by Chemical Vapor Deposition (opens in a new tab)

  7. Nonohmic Electrical Conductivity and Giant Dielectric Constant in Methyltriphenyl Arsonium Ditetracyanoquino Dimethane

    Quite large, well-formed single crystals of m(phi)(,3)As(TCNQ)(,2) crystals have been grown. The largest of these crystals are probably the largest TCNQ salt crystals ever grown; they may also be the most perfect.

    uiuc Repository record for Nonohmic Electrical Conductivity and Giant Dielectric Constant in Methyltriphenyl Arsonium Ditetracyanoquino Dimethane (opens in a new tab)

  8. Low dielectric constant fluorocarbon films containing silicon by plasma enhanced chemical vapor deposition

    Use of low relative dielectric constant (low-k) material as an interlayer dielectric is among important approaches to reduce the RC time delay in high performance ultra-large-scale integrated circuits. Copper metallization is another approach besides the use of low-k material, in reducing the RC …

    lsu-thes Repository record for Low dielectric constant fluorocarbon films containing silicon by plasma enhanced chemical vapor deposition (opens in a new tab)

  9. Chemical vapor deposition of fluorocarbon films for low dielectric constant thin film applications

    … fluorocarbon films with the potential use as low dielectric constant interconnect materials in microelectronic circuits. Solid-state nuclear magnetic resonance spectroscopy was demonstrated as a valuable film characterization tool to understand structure-property processing fundamentals, …

    mit Repository record for Chemical vapor deposition of fluorocarbon films for low dielectric constant thin film applications (opens in a new tab)

  10. Theoretical Study of the Transverse Dielectric Constant of Superlattices and Their Alloys (Refraction, Absorption)

    … the real and imaginary parts of the transverse dielectric constant, (epsilon)((omega)) = (epsilon)(,1)((omega)) + i(epsilon)(,2)((omega)). Emphasis is given to determining the influence of different material and superlattice (layer thickness and Al composi- tion) parameters on the values of the …

    uiuc Repository record for Theoretical Study of the Transverse Dielectric Constant of Superlattices and Their Alloys (Refraction, Absorption) (opens in a new tab)

  11. Design guidelines and synthesis of a low dielectric constant inorganic composite for high performance microelectronic packaging

    … to achieving a maximum reduction of the dielectric constant of the resulting composite with a minimum loss in strength. A layered sphere Bruggeman effective-medium model was developed, which describes well, the expected dielectric constant of the composite. The model incorporates the …

    uiuc Repository record for Design guidelines and synthesis of a low dielectric constant inorganic composite for high performance microelectronic packaging (opens in a new tab)

  12. Measurement of high frequency dielectric constant and conductivity of fluids and fluid-saturated rocks at high pressure

    Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1990.

    mit Repository record for Measurement of high frequency dielectric constant and conductivity of fluids and fluid-saturated rocks at high pressure (opens in a new tab)

  13. Study of PECVD Films Containing Flourine and Carbon and Diamond Like Carbon Films for Ultra Low Dielectric Constant Interlayer Dielectric Applications

    … (BEOL) structures by decreasing the dielectric permittivity of the interlayer dielectric material in integrated circuits (ICs) lowers device delay times, power consumption and parasitic capacitance. a:C-F films that are thermally stable at 400C were deposited using tetrafluorocarbon …

    tdl Repository record for Study of PECVD Films Containing Flourine and Carbon and Diamond Like Carbon Films for Ultra Low Dielectric Constant Interlayer Dielectric Applications (opens in a new tab)

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