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Showing 1 to 4 of 4 for “"Di(tert-butyl)amido"”.
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Synthesis, characterization and chemical vapor deposition of transition metal di(tert-butyl)amido compounds
Although the transition metal chemistry of many dialkylamido ligands has been well studied, the chemistry of the bulky di(tert-butyl)amido ligand has been largely overlooked. The di(tert-butyl)amido ligand is well suited for synthesizing transition metal compounds with low coordination numbers; …
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Low-Temperature Chemical Vapor Depostion of Ruthenium and Manganese Nitride Thin Films
… vapor deposition from the volatile manganese(II) amido precursor bis[di(tert)-butyl)amido]manganese(II)and ammonia. Between 80 and 200°C, the films grown from bis[di(tert )-butyl)amido]manganese(II)contain crystalline eta-Mn3N 2. At 300°C, a mixture of eta- and xi-phase manganese nitride …
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Ultraconformal chemical vapor deposition and synthesis of transition metal nitride films
… on materials processing techniques. As device dimensions decrease, the aspect ratios (AR) of features tend to increase. Uniform coating of these features is required, but the difficulty scales with AR. I have demonstrated ‘static’ CVD in a simple, unpumped apparatus to conformally deposit …
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Syntheses, properties, and reactions of transition metal complexes of di(tert-butyl)amide and 2,2,6,6-tetramethylpiperidide
… and saturation magnetization than the corresponding metals. These nitrides have realized and potential applications in tool coatings and magnetic recording media. In order to develop new chemical vapor deposition (CVD) precursors for these late transition metal nitrides, we have explored the …