Global ETD Search
Search theses and dissertations gathered from participating repositories worldwide. Every result links back to the library that holds it. No account is needed.
Results
Showing 1 to 7 of 7 for “"Design for Manufacturability (DFM)"”.
-
A true generative CAPP system for DFM application to machined components
… and exchange of computer interpretable information between product design and the manufacturing system. Computer-Aided Process Planning (CAPP) is an essential key for achieving closer links among design and manufacturing activities. The purpose of process planning is to generate feasible …
-
Design for manufacturability methodology and data representation framework for machined components
… in nature, with the product going through design, process planning, manufacturing and assembly. This sequential decision making results in increased costs and higher product development times. With the trend towards better product quality, product customization, shorter product life cycle, …
-
Manufacturability Assessment of the Navy Integrated Power and Energy Corridor (NiPEC)
… by the Zumwalt class destroyer and the forthcoming DDG(X), the demand for electrical power on future ships is projected to exceed 100 megawatts. To meet this challenge, the Massachusetts Institute of Technology (MIT) Sea Grant Program’s Design Laboratory, in collaboration with the …
-
Efficient IC statistical modeling and extraction using a Bayesian inference framework
… is a key challenge to ensure robust circuit performance as well as high manufacturing yield. In this thesis, we present an ecient framework for device and circuit variability modeling and extraction by combining an ultra-compact transistor model, called the MIT virtual source (MVS) model, and a …
-
Tecniche di progettazione tollerante alle variazioni per circuiti digitali in tecnologie nanometriche
… power, cost and increase the computational performance of integrated circuits. This trend, known as technology scaling, is approaching the nanometer size. The lithographic process in the manufacturing stage is increasing its uncertainty with the scaling down of the transistors size, resulting …
-
Optimization for advanced lithography
… improving the fabrication processes. Instead, design-technology co-optimization (DTCO) via electronic design automation (EDA) software is a more effective way. Targeting the most promising lithography and process techniques for advanced technology nodes below 20 nm, in this thesis we study …
-
Design-technology co-optimization in next generation lithography
… manufacturing capability and the expectation of design performance finally pushes the conventional 193 nm ArF immersion lithography to its limit, calling for a complete new set of design and manufacturing methodologies under the scope of next generation lithography. Many innovations are needed to …