Global ETD Search

Search theses and dissertations gathered from participating repositories worldwide. Every result links back to the library that holds it. No account is needed.

Results

Showing 1 to 4 of 4 for “"Crystalline silicon (Si)"”.

  1. Optoelectronic properties of size-selected silicon nanocrystals

    Thin films of silicon nanocrystals (Si-nc) were produced by laser pyrolysis of silan and accumulated on various substrates. Layer growth, optical properties, charge transport, photoluminescence (PL) and electroluminescence (EL) were investigated on these porous layers. A stick-ball model for layer …

    oldenburg Repository record for Optoelectronic properties of size-selected silicon nanocrystals (opens in a new tab)

  2. Desarrollo de sustratos de carburo de silicio mediante carburización e implantación iónica de silicio monocristalino

    … of formation involved in both thin films and crystalline precipitates of silicon carbide (SiC) are studied in this Ph. D. thesis. SiC is fabricated starting from single-crystalline silicon (Si) substrates by carbonization or by ion implantation. The characterization of these structures allows …

    cadiz Repository record for Desarrollo de sustratos de carburo de silicio mediante carburización e implantación iónica de silicio monocristalino (opens in a new tab)

  3. Optical design guidelines for spectral splitting photovoltaic systems : a sensitivity analysis approach

    … the most popular method used today for harnessing this power. However, the costs of these systems are still higher than traditional fossil fuel generation, leading to limited adoption. One of the major drivers of cost is the efficiency with which PV systems convert solar energy to electricity. …

    mit Repository record for Optical design guidelines for spectral splitting photovoltaic systems : a sensitivity analysis approach (opens in a new tab)

  4. Metal-assisted chemical etching of semiconductor nanostructures for electronic applications

    Metal-assisted Chemical Etching (MacEtch) is a robust and versatile top-down etching process which has the capability of overcoming the limits of conventional wet and dry etching. The advantage of producing anisotropic high aspect ratio micro- and nanostructures with the absence of ion induced …

    uiuc Repository record for Metal-assisted chemical etching of semiconductor nanostructures for electronic applications (opens in a new tab)