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Showing 1 to 1 of 1 for “"Copper interconnect systems"”.

  1. Deposition and properties of Co- and Ru-based ultra-thin films

    Future copper interconnect systems will require replacement of the materials that currently comprise both the liner layer(s) and the capping layer. Ruthenium has previously been considered as a material that could function as a single material liner, however its poor ability to prevent copper

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