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Showing 1 to 5 of 5 for “"Contamination removal"”.

  1. Optimization, Testing and Design-for-Testability of Flow-Based Microfluidic Biochips

    … number of control pins.</p><p>The problem of contamination removal in flow-based microfluidic biochips must also be addressed. Applications in biochemistry require high precision to avoid erroneous assay outcomes, and they are vulnerable to contamination between two fluidic flows with …

    duke Repository record for Optimization, Testing and Design-for-Testability of Flow-Based Microfluidic Biochips (opens in a new tab)

  2. Removal of arsenic from drinking water.

    regina Repository record for Removal of arsenic from drinking water. (opens in a new tab)

  3. Experimental Studies for Development of a Purification Process for Single and Mixed Amine Solvents

    Amine solvents used for the removal of CO2 from flue gas are subject to solvent degradation, which results from the reaction of impurities in the gas stream. This leads to the formation of degradation products, which could lead to many operational problems such as changes in the solvent absorption …

    regina Repository record for Experimental Studies for Development of a Purification Process for Single and Mixed Amine Solvents (opens in a new tab)

  4. Removal of organic contaminants from lithographic materials

    … amount of photon loss for illumination, however contamination in the sys- tem is unavoidable, especially due to carbon growth on the multilayer mirror collectors and to soft defects in the form of organic contamination on the mask. Traditional cleaning methods employ the use of wet chemicals to …

    uiuc Repository record for Removal of organic contaminants from lithographic materials (opens in a new tab)

  5. Plasma Assisted Cleaning by Electrostatics of Insulating Nanometer Scale Contamination from Materials Used in Integrated Circuit Manufacturing

    Made available in DSpace on 2017-07-06T18:55:12Z (GMT). No. of bitstreams: 3 Lytle_Wayne_M_MS.pdf: 27922220 bytes, checksum: 67faae2239adf87cba4f0a7f443a8456 (MD5) Lytle_Wayne_M_MS_ABS.pdf: 35267 bytes, checksum: 25efd85c0e399395e1a5a857fbd3a791 (MD5) license.txt: 4813 bytes, checksum: …

    uiuc Repository record for Plasma Assisted Cleaning by Electrostatics of Insulating Nanometer Scale Contamination from Materials Used in Integrated Circuit Manufacturing (opens in a new tab)