Global ETD Search
Search theses and dissertations gathered from participating repositories worldwide. Every result links back to the library that holds it. No account is needed.
Results
Showing 1 to 20 of 562 for “"Chemical Vapor Deposition"”.
-
Particle generation in a chemical vapor deposition/plasma-enhanced chemical vapor deposition interlayer dielectric tool
… the layer. In this study, particle generation, deposition, and adhesion mechanisms are reviewed. In particular, four important sources of interlayer dielectric particle contamination were investigated: the cleanroom environment, improper wafer handling, the backside of the wafer, and microarcing …
-
Chemical vapor deposition of polymeric films
… high environmental stability. In this project, chemical vapor deposition (CVD) and plasma enhanced chemical vapor deposition (PECVD) of carbon films with PPN structure using PTCDA as precursor were carried out under different conditions. There is only limited information in literature on the …
-
Precursors for copper chemical vapor deposition
… of producing copper films of high quality by chemical vapor deposition (CVD). We investigated some copper(I) and copper(II) complexes as precursors for chemical or photochemical vapor deposition. In chapter 2, we synthesized a series of Cu(hfac)<sub>2</sub>(amine) adducts, where …
-
Selective area chemical vapor deposition of graphene
… integration with other 2D materials. Chemical vapor deposition (CVD) of graphene is the most promising way by far for the synthesis of large-scale single-crystal graphene. In this dissertation, we study the low-pressure chemical vapor deposition (LPCVD) of graphene on commercial copper …
-
Chemical vapor deposition of functionalized isobenzofuran polymers
This thesis develops a platform for deposition of polymer thin films that can be further tailored by chemical surface modification. First, we explore chemical vapor deposition of functionalized isobenzofuran films using two different functional groups: pentafluorophenolate ester and alkyne. Both …
-
Chemical vapor deposition of antimicrobial polymer coatings
… materials and surfaces antimicrobial. Initiated chemical vapor deposition (iCVD), a solventless low-temperature process, is used to form thin films of polymers on fragile substrates. To improve research efficiency, a new combinatorial iCVD system was fabricated and used to efficiently determine …
-
Multiscale modeling strategies for chemical vapor deposition
… devices as a function of growth conditions in chemical vapor deposition (CVD) reactors, a model should describe multiple time and length scales. These scales include the reactor scale ([approx]0.1-1 m), the feature scale ([approx.]0.1-100 [mu]m), and the atomistic morphology evolution scale …
-
Metalorganic chemical vapor deposition of metal oxides
… substrates by hot wall metalorganic chemical vapor deposition (MOCVD). Bis(cyclopentadienyl)ruthenium [Ru(C₅H₅)₂], zirconium tetramethylheptanedione [Zr(thd)₄], triphenylbismuth [Bi(C₆H₅)₃], and titanium ethoxide [Ti(C₂H₅O)₄] were used as precursors. MOCVD RuO₂ film structure was …
-
Polymeric nitrogen by plasma enhanced chemical vapor deposition
… the first detailed study of a plasma-enhanced chemical vapor deposition (PECVD) approach to the synthesis of polymeric nitrogen. PECVD provides non-equilibrium conditions known to produce high pressure-temperature phases. Molecular nitrogen mixed with hydrogen and argon is used as the gas phase …
-
Kinetic optimization of titanium silicide chemical vapor deposition
… interest has arisen in fabrication by chemical vapor deposition (CVD) because of scalability problems with the salicide process (a Ti-Si solid-phase reaction) that currently defines the state-of-the-art. Furthermore, the possibility of selective CVD on Si vs SiO$\sb 2$ offers the …
-
Nucleation inhibition and enhancement in chemical vapor deposition
Area selective deposition (ASD) is becoming increasingly attractive as a bottom-up approach to nanomanufacturing. Most ASD processes developed so far concern selective deposition of metal on metal (i.e., not on non-metallic surfaces) or oxide on oxide (i.e., not on metallic surfaces), but …
-
Environmentally focused patterning and processing of polymer thin films by initiated chemical vapor deposition (iCVD) and oxidative chemical vapor deposition (oCVD)
… increase in raw materials utilization. Initiated Chemical Vapor Deposition (iCVD) is a low-energy, one step, solvent-free process for producing polymeric thin films This thesis describes the deposition of a novel low-k iCVD precursor, 1,3,5,7-tetravinyltetramethylcylcotetrasiloxane (V4D4). The …
-
Laser-assisted metalorganic chemical vapor deposition of zinc selenide
Laser-assisted metalorganic chemical vapor deposition (LMOCVD) has been used to grow epitaxial zinc selenide at temperatures as low as 200$\sp\circ$C. The metalorganic sources, dimethylzinc (DMZ) and diethylselenide (DESe), were photodissociated with radiation from a 193 nm ArF excimer laser …
-
A Simplified Model of Planetary Chemical Vapor Deposition Reactors
A simplified model for planetary chemical vapor deposition reactors is proposed and used to compute deposition species mole fraction and deposition rate in the reactor depletion zone. First, the modeling and optimization work performed in the literature is reviewed and their representative …
-
Investigating electron transport in chemical vapor deposition graphene nanostructures
… investigates electron transport properties in chemical vapor deposition (CVD) graphene-related nanostructures. There are many potential electronic and optoelectronic applications envisioned for graphene, due to its two-dimensional character and exceptional properties. However, the lack of …
-
Semiconductor Laser Arrays Grown by Metalorganic Chemical Vapor Deposition
The metalorganic chemical vapor deposition system (MOCVD) allows for the growth of ultrathin epitaxial layers of III-V semiconductor compounds. This vapor deposition process is well suited for the growth of high performance semiconductor laser structures. Experimental data have been collected on a …
-
Properties of graphene nanoribbons obtained by chemical vapor deposition
We use chemical vapor deposition (CVD) to synthesize graphene films on copper foil. After transferring the graphene to SiO2/Si substrates, we pattern the film into graphene nanoribbons (GNRs) of width < ~50 nm and length < ~ 700 nm with Ti/Au contacts. We perform low-bias, high-bias, and …
-
Chemical kinetic studies of titanium silicide chemical vapor deposition
Item marked as restricted to the 'UIUC Users [automated]' Group (id=2) by Howard Ding (hding2@illinois.edu) on 2011-05-07T14:48:04Z Item is restricted indefinitely.
-
Aminodiboranates: syntheses, structures, and applications for chemical vapor deposition
… one bridges the long Th•••B contact. Quantum chemical calculations suggest that Th(H₃BNMe₂BH₃)₄ is 16-coordinate in the gas phase and that the 15-coordinate solid-state structure can be attributed to packing effects. Compound 1 reacts at elevated temperatures (80–110 °C) to produce (NMe₂BH₂)₂ …
Page 1 of 29