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Showing 1 to 1 of 1 for “"Atomic Layer Deposition, high-k, microelectronic"”.
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Dielectric materials by Atomic Layer Deposition for microelectronic applications
The Atomic Layer Deposition (ALD) is an innovative technique to deposit thin film materials for several application fields. The rapid affirmation of the ALD process is related to the peculiarities of the deposition mechanism. In particular, because of the self-limiting principle and of the …