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Showing 1 to 4 of 4 for “"Amidate"”.

  1. Amidate complexes of the group 4 metals : sythesis, reactivity, and hydroamination catalysis

    A series of bidentate amidate ligands with variable groups R' and R" abbreviated by [R"(NO)R'] and adamantyl substituted tetradentate amidate ligands abbreviated by Ad[0₂N₂] were utilized as ancillaries for Ti, Zr, and Hf. Protonolysis routes into homoleptic amidate complexes, tris(amidate) …

    ubc Repository record for Amidate complexes of the group 4 metals : sythesis, reactivity, and hydroamination catalysis (opens in a new tab)

  2. Synthesis And Characterization Of Group 5 Metal Complexes Containing Pyrazolate, Amidate, And Related Ligands As Potential Precursors For Thin Film Growth By Atomic Layer Deposition

    … and tantalum(IV) complexes from pyrazolate, amidate, and α-iminoketone ligand systems. Pyrazolate compounds undergo reductive N-N bond cleavage on Nb(IV) and Ta(IV) metal centers and afford six membered metallacycles that are analogous to metallapyrimidines and metallapyrimidiniums. Two other …

    wayne-thes Repository record for Synthesis And Characterization Of Group 5 Metal Complexes Containing Pyrazolate, Amidate, And Related Ligands As Potential Precursors For Thin Film Growth By Atomic Layer Deposition (opens in a new tab)

  3. Mechanistic studies on metal-catalyzed carbon-nitrogen bond forming reactions

    … we demonstrate that a 1,2-diamine ligated Cu(I)-amidate may potentially serve as the reactive species that undergoes aryl halide activation. This was established through both its chemical and kinetic competency in the stoichiometric N-arylation process. This behavior has important consequences …

    mit Repository record for Mechanistic studies on metal-catalyzed carbon-nitrogen bond forming reactions (opens in a new tab)

  4. Precursors And Processes For The Growth Of Metallic First Row Transition Metal Films By Atomic Layer Deposition

    … of Mo and W complexes containing amidate and carbohydrazide ligands. These new complexes are volatile between 120-170 ¢XC at 0.05 Torr, and thermally decompose temperatures between 193 ¢XC and 355 ¢XC, which should allow low temperature ALD of oxide films. </p> <p> Ligands that are …

    wayne-thes Repository record for Precursors And Processes For The Growth Of Metallic First Row Transition Metal Films By Atomic Layer Deposition (opens in a new tab)