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Showing 1 to 1 of 1 for “"ALD, Atomic Layer Deposition, Chemical Vapor Deposition, CVD, Thin Film, Volatile Precursors"”.

  1. New precursors and chemistry for the growth of transition metal films by atomic layer deposition

    … rigorous demands on currently used PVD and CVD deposition techniques. The ALD deposition method is proposed to meet the film thickness and conformality constraints needed by the semiconductor industry in future manufacturing processes. Unfortunately, there is a limited number of chemical …

    wayne-thes Repository record for New precursors and chemistry for the growth of transition metal films by atomic layer deposition (opens in a new tab)