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Virginia Polytechnic Institute and State University

Recombination lifetime analysis of deep levels in silicon

Abstract

dc:description.abstract

By the addition of selected impurities to silicon it is possible to affect its physical, optical and electrical properties to a remarkable extent. Of great technological importance are the elements of groups III and V which introduce shallow acceptor and donor levels and control the equilibrium charge density. These levels have been studied extensively and are well understood. However, other impurities and structural defects are known to introduce deep levels. These levels may act as acceptors or donors in the traditional sense but they can also control the recombination of non-equilibrium charge carriers. The properties of these recombination levels reflect the processes of energy exchange and provide information on the defect structure and energy spectrum and are thus of physical interest. Also since they control the excess carrier lifetime which is a critical parameter in many semiconductor devices they are of interest to the technologist. The major difficulty in analyzing these levels arises from the catalytic nature of the recombination centers which allows an extremely low density of centers to significantly affect the recombination lifetime. Most bulk single crystal silicon techniques applied to date use activation processes with high resistivity, high recombination center density samples. This severely limits the range and sensitivity of analysis. In this dissertation is detailed a new approach to more accurately determine lifetime parameters in conjunction with a phenomenological model which describes the recombination using a set of characterizing parameters. The technique is used to characterize the levels responsible for recombination in single crystal silicon after controlled heat treatments and, also, in gamma irradiated and impurity containing silicon.

Degree

thesis:*
Name thesis:degree_name
Ph. D.
Level thesis:degree_level
doctoral
Department dc:contributor.department
Physics
Grantor dc:publisher
Virginia Polytechnic Institute and State University
Year dc:date.issued
1984

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Robinson, Murray John
Chair dc:contributor.committeechair
  • Gilmer, Thomas E.
Committee members dc:contributor.committeemember
  • Williams, Clayton D.
  • Ritter, Alfred "Jimmy"
  • Leinhardt, T.E.
  • Ficenec, John R.

Rights

dc:rights
Statement dc:rights
  • In Copyright
Language dc:language.iso
en_US

Identifiers

dc:identifier.*
Handle dc:identifier.uri
http://hdl.handle.net/10919/87658
OAI identifier oai:identifier
oai:vtechworks.lib.vt.edu:10919/87658

Chain of custody

source
Harvested from
Virginia Tech
Base URL
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Last updated
2026-07-22
Source record
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citation

Robinson, Murray John. Recombination lifetime analysis of deep levels in silicon. doctoral thesis, Virginia Polytechnic Institute and State University, 1984. http://hdl.handle.net/10919/87658