Ion Energy Characterization Study for Next Generation Semiconductor Lithography Based on Gas Discharge Produced Plasma Technology

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Name thesis:degree_name

M.S. (master's)

Level thesis:degree_level

Thesis

Discipline thesis:degree_discipline

Nuclear, Plasma, and Radiological Engineering

Year dc:date

2017

Author dc:creator

• Spencer, Joshua B.

• nuclear engineering
• lithography
• gas discharge plasma
• ion energy
• bragg interference

Statement dc:rights

• Copyright 2007 Melissa Anita Schear

Language dc:language

en

Handle dc:identifier

http://hdl.handle.net/2142/96543

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/96543