Physical properties of thin film, metastable titanium(0.5)aluminum(0.5)nitrogen alloys deposited by reactive magnetron sputtering

Metastable, NaCl-structure, polycrystalline Ti$\sb{0.5}$Al$\sb{0.5}$N films, 3-5 μm thick, have been deposited on stainless-steel substrates by d.c. reactive magnetron sputtering. The effects of low-energy (E $\leq$ 250 eV) ion bombardment during deposition on thin film microstructure, oxidation properties, and optical reflectance of the metastable alloy were evaluated.

Name thesis:degree_name

Ph.D.

Level thesis:degree_level

Dissertation

Discipline thesis:degree_discipline

Engineering, Metallurgy

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2011

Author dc:creator

• McIntyre, Dale Charles

Contributors dc:contributor

• Greene, Joseph E.

• Engineering, Metallurgy
• Engineering, Materials Science

Statement dc:rights

• Copyright 1989 McIntyre, Dale Charles

Language dc:language

eng

Identifier

AAI9010953
(UMI)AAI9010953

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/23769