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Massachusetts Institute of Technology

Chemical vapor deposition modeling using direct simulation Monte Carlo with non-linear chemistry and level set profile evolution

Abstract

dc:description

Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 2003.

Degree

thesis:*
Department dc:contributor.department
Massachusetts Institute of Technology. Department of Mechanical Engineering.
Grantor dc:publisher
Massachusetts Institute of Technology
Year dc:date.issued
2003

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Al-Mohssen, Husain Ali, 1977-
Advisor dc:contributor.advisor
  • Nicolas G. Hadjiconstantinou.

Subjects

dc:subject × 1

Rights

dc:rights
Statement dc:rights
  • M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
Language dc:language.iso
eng

Identifiers

dc:identifier.*
Handle dc:identifier.uri
http://hdl.handle.net/1721.1/89933
OAI identifier oai:identifier
oai:dspace.mit.edu:1721.1/89933

Chain of custody

source
Harvested from
MIT
Base URL
dspace.mit.edu/oai/request
Last updated
2026-07-22
Source record
OAI-PMH GetRecord
citation

Al-Mohssen, Husain Ali, 1977-. Chemical vapor deposition modeling using direct simulation Monte Carlo with non-linear chemistry and level set profile evolution. Massachusetts Institute of Technology, 2003. http://hdl.handle.net/1721.1/89933