A dual-laser interferometry system for thin film measurements in thermal vapor deposition applications

Lithography processes harnessing the phase change of the chemically inert carbon dioxide as a resist have been shown as a possible alternative to patterning thin film organic semiconductors and metals. The ability to control the resist's growth would make the lithography process more reliable and ecient. This thesis seeks to control and observe the physical properties of the carbon dioxide resist via the optical technique of dual-laser interferometry in conjunction with a quartz crystal micro balance (QCMB).

Department dc:contributor.department

Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science.

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

2012

Author dc:creator

• Yin, Allen Shiping

Advisor dc:contributor.advisor

• Marc A. Baldo.

• Electrical Engineering and Computer Science.

Statement dc:rights

• M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/1721.1/85231

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/85231