Field solver technologies for variation-aware interconnect parasitic extraction

Advances in integrated circuit manufacturing technologies have enabled high density onchip integration by constantly scaling down the device and interconnect feature size. As a consequence of the ongoing technology scaling (from 45nm to 32nm, 22nm and beyond), geometrical variabilities induced by the uncertainties in the manufacturing processes are becoming more significant. Indeed, the dimensions and shapes of the manufactured devices and interconnect structures may vary by up to 40% from their design intent. The effect of such variabilities on the electrical characteristics of both devices and interconnects must be accurately evaluated and accounted for during the design phase. In the last few years, there have been several attempts to develop variation-aware extraction algorithms, i.e. algorithms that evaluate the effect of geometrical variabilities on the electrical characteristics of devices and interconnects. However, most algorithms remain computationally very expensive. In this thesis the focus is on variation-aware interconnect parasitic extraction. In the first part of the thesis several discretization-based variation-aware solver techniques are developed. The first technique is a stochastic model reduction algorithm (SMOR) The SMOR guarantees that the statistical moments computed from the reduced model are the same as those of the full model. The SMOR works best for problems in which the desired electrical property is contained in an easily defined subspace.

Department dc:contributor.department

Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science.

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

2010

Author dc:creator

• El-Moselhy, Tarek Ali

Advisor dc:contributor.advisor

• Luca Daniel.

• Electrical Engineering and Computer Science.

Statement dc:rights

• M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/1721.1/58276

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/58276