Nodal photolithography : lithography via far-field optical nodes in the resist

In this thesis, I investigate one approach - stimulated emission depletion - to surmounting the diffraction limitation of optical lithography. This approach uses farfield optical nodes to orchestrate reversible, saturable optical transitions in certain photoresist compounds. After addressing prior work in resolution enhancement via optical nodes (for metastable atom localization, reversible absorbance modulation, and fluorescence microscopy), I examine the issues of resist formulation, optical pulse width bounds due to resist kinetics, and patterning schemes for low- and high-volume throughput. The experimental realization of stimulated emission depletion is described, and challenges for lithography using this technique are discussed.

Department dc:contributor.department

Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science.

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

2008

Author dc:creator

• Winston, Donald, S.M. Massachusetts Institute of Technology

Advisor dc:contributor.advisor

• Karl K. Berggren.

• Electrical Engineering and Computer Science.

Statement dc:rights

• M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/1721.1/43065

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/43065