Massachusetts Institute of Technology
Novel patterning techniques for manufacturing organic and nanostructured electronics
Abstract
dc:description.abstractMolecular organic semiconductors and nanometer size particles are two new classes of functional materials allowing fabrication of electronic devices on low-cost and large area substrates. Patterning these electronic materials requires the development of unconventional techniques, and the scientific understanding behind the manufacture processes. We introduce the first-generation Molecular Jet (MoJet) printing technique for vacuum deposition of evaporated thin films and apply it to the fabrication of high-resolution pixelated (800 ppi) molecular organic light emitting devices (OLEDs) based on aluminum tris(8-hydroxyquinoline) (Alq3), and the fabrication of pentacene based organic field effect transistors (OFETs) with narrow channel (15 gm) and asymmetric silver/gold contacts. Patterned printing of both organic and metal films is demonstrated, with the operating properties of MoJet-printed OLEDs and OFETs shown to be comparable with the performance of devices fabricated by conventional evaporative deposition through a metal stencil. This MoJet printing technique is reconfigurable for digital fabrication of arbitrary patterns with multiple material sets and a high print accuracy of better than 5gtm, and scalable to large area substrates.
Degree
thesis:*- Department dc:contributor.department
- Massachusetts Institute of Technology. Dept. of Materials Science and Engineering.
- Grantor dc:publisher
- Massachusetts Institute of Technology
- Year dc:date.issued
- 2007
Author and committee
dc:creator, dc:contributor.*- Author dc:creator
-
- Chen, Jianglong, 1976-
- Advisor dc:contributor.advisor
-
- Vladimir Bulović.
Subjects
dc:subject × 1Rights
dc:rights- Statement dc:rights
-
- M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
- Licence dc:rights.uri
- Language dc:language.iso
- eng
Identifiers
dc:identifier.*- Identifier URI
- http://dspace.mit.edu/handle/1721.1/39552
- OAI identifier oai:identifier
- oai:dspace.mit.edu:1721.1/39552