Chemical vapor deposition of functionalized isobenzofuran polymers

This thesis develops a platform for deposition of polymer thin films that can be further tailored by chemical surface modification. First, we explore chemical vapor deposition of functionalized isobenzofuran films using two different functional groups: pentafluorophenolate ester and alkyne. Both functional groups can be further modified using either ester substitution or click chemistry, respectively. The resulting thin films are characterized extensively using nuclear magnetic resonance (NMR), Raman spectroscopy, and X-ray photoelectron spectroscopy (XPS). We show that the functional groups remain on the surface post deposition for both films at cracking temperature not exceeding 6000C. However, gel permeation chromatography(GPC) measurements of the pentafluorophenolate ester films show only marginal polymerization. On the other hand, the alkyne films appear crosslinked and showed defect formation. Films deposited at ambient temperature show formation of a large number of micro defects. Increasing the deposition temperature, in addition to increasing the growth rate, also leads to formation of films with two distinct domains: one smooth domain with no micro defects and another filled with defects.

Department dc:contributor.department

Massachusetts Institute of Technology. Dept. of Materials Science and Engineering.

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

2007

Author dc:creator

• Olsson, Ylva Kristina

Advisor dc:contributor.advisor

• Klavs F. Jensen.

• Materials Science and Engineering.

Statement dc:rights

• M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/1721.1/38584

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/38584