Massachusetts Institute of Technology
Anisotropic and tunable characteristics of the colloidal behavior of metal oxide surfaces
Abstract
dc:description.abstractThe electroosmotic behavior of the rutile polymorph of titanium dioxide was explored as a function of crystallographic orientation. Atomic force microscopy (AFM) was employed to make high-resolution force spectroscopy measurements between a silica sphere attached to a traditional, contact-mode AFM cantilever and TiO2 (110), (100), and (001) surfaces in aqueous solutions. Measurements were taken in a variety of solution conditions across a broad range of pH values, and the resultant force-distance curves were used to deduce relative behaviors of each orientation of rutile, with particular interest in changes of the isoelectric point (iep). Differences in iep as a function of orientation are explained in terms of differences in both the coordination number and density of (Lewis) acidic and basic sites on the surface. The results were supported by angle-resolved X-ray photoelectron spectroscopy (XPS) measurements of a nominal monolayer of palladium metal deposited on each of the three orientations studied. The palladium monolayer served as a means of probing the relative electron affinities of the three surfaces studied, which was exhibited in shifts of the palladium XPS peak that corresponded to differences in binding energy as a function of substrate orientation.
Degree
thesis:*- Department dc:contributor.department
- Massachusetts Institute of Technology. Dept. of Materials Science and Engineering.
- Grantor dc:publisher
- Massachusetts Institute of Technology
- Year dc:date.issued
- 2006
Author and committee
dc:creator, dc:contributor.*- Author dc:creator
-
- Bullard, Joseph Warren, 1978-
- Advisor dc:contributor.advisor
-
- Michael J Cima.
Subjects
dc:subject × 1Rights
dc:rights- Statement dc:rights
-
- M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
- Licence dc:rights.uri
- Language dc:language.iso
- eng
Identifiers
dc:identifier.*- Handle dc:identifier.uri
- http://hdl.handle.net/1721.1/37372
- OAI identifier oai:identifier
- oai:dspace.mit.edu:1721.1/37372