Low temperature deposition of metal carbide films from single source precursors

Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Nuclear Engineering, 1994, and Thesis (B.S.)--Massachusetts Institute of Technology, Dept. of Materials Science & Engineering, 1994.

Department dc:contributor.department

Massachusetts Institute of Technology. Department of Nuclear Engineering

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

1994

Author dc:creator

• Rubiano, Rodrigo R. (Rubiano Ray)

Advisor dc:contributor.advisor

• Uday, B. Pal.

• Nuclear Engineering
• Materials Science and Engineering

Statement dc:rights

• M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/1721.1/34692

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/34692