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Massachusetts Institute of Technology

Accurate nanofabrication techniques for high-index-contrast microphotonic devices

Abstract

dc:description.abstract

High-refractive-index-contrast microphotonic devices provide strong light confinement allowing for sharp waveguide bends and small dielectric optical resonators. They allow dense optical integration and unique applications to optical filters and sensors but present exceptional complications in design and fabrication. In this work, nanofabrication techniques are developed to address the two main challenges in fabrication of high-index contrast microphotonic devices: sidewall roughness and dimensional accuracy. The work focuses on fabrication of optical add-drop filters based on high-index contrast microring-resonators. The fabrication is based on direct-write scanning-electronbeam lithography. A sidewall-roughness characterization and optimization scheme is developed as is the first three-dimensional analysis of scattering losses due to sidewall roughness. Writing strategy in scanning-electron-beam lithography and absolute and relative dimensional control are addressed. The nanofabrication techniques developed allowed fabrication of the most advanced microring add-drop-filters reported in the literature. The sidewall-roughness standard deviation was reduced to 1.6 nm.

Degree

thesis:*
Department dc:contributor.department
Massachusetts Institute of Technology. Dept. of Materials Science and Engineering.
Grantor dc:publisher
Massachusetts Institute of Technology
Year dc:date.issued
2005

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Barwicz, Tymon
Advisor dc:contributor.advisor
  • Henry I. Smith and Harry L. Tuller.

Subjects

dc:subject × 1

Rights

dc:rights
Statement dc:rights
  • M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
Language dc:language.iso
eng

Identifiers

dc:identifier.*
Handle dc:identifier.uri
http://hdl.handle.net/1721.1/33169
OAI identifier oai:identifier
oai:dspace.mit.edu:1721.1/33169

Chain of custody

source
Harvested from
MIT
Base URL
dspace.mit.edu/oai/request
Last updated
2026-07-22
Source record
OAI-PMH GetRecord
citation

Barwicz, Tymon. Accurate nanofabrication techniques for high-index-contrast microphotonic devices. Massachusetts Institute of Technology, 2005. http://hdl.handle.net/1721.1/33169