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Massachusetts Institute of Technology

Critical gas-phase and surface reactions involved in the chemical vapor desposition of diamond films

Abstract

dc:description

Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1995.

Degree

thesis:*
Department dc:contributor.department
Massachusetts Institute of Technology. Dept. of Chemical Engineering
Grantor dc:publisher
Massachusetts Institute of Technology
Year dc:date.issued
1995

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Wolden, Colin Andrew
Advisor dc:contributor.advisor
  • Karen K. Gleason.

Subjects

dc:subject × 1

Rights

dc:rights
Statement dc:rights
  • M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
Language dc:language.iso
eng

Identifiers

dc:identifier.*
Handle dc:identifier.uri
http://hdl.handle.net/1721.1/32158
OAI identifier oai:identifier
oai:dspace.mit.edu:1721.1/32158

Chain of custody

source
Harvested from
MIT
Base URL
dspace.mit.edu/oai/request
Last updated
2026-07-22
Source record
OAI-PMH GetRecord
related terms
citation

Wolden, Colin Andrew. Critical gas-phase and surface reactions involved in the chemical vapor desposition of diamond films. Massachusetts Institute of Technology, 1995. http://hdl.handle.net/1721.1/32158