Defect and electrical properties of high-K̳ dielectric Gd₂O₃ for magneto-ionic and memristive memory devices

While high-[subscript K] dielectrics utilized in CMOS technology are noted for their highly insulating characteristics, they have demonstrated surprising electrolytic behavior as key components in a variety of thin film memory devices, including those based on magneto-ionic and memristive behavior. In this work, we focus on the rare earth sesquioxide, Gd₂O₃, a well-known high-κ dielectric that has exhibited a variety of electrolytic properties during the development and operation of the first magneto-ionic devices developed at MIT. Specifically, we focused our investigation on the defect chemistry and electrical properties of Gd₂O₃ in order to better understand the relationship between the structure, chemistry, processing conditions, and operating environment and the material's low-temperature ionic and electronic transport properties and the means for their optimization vis-à-vis memory device operation.

Name thesis:degree_name

Doctoral

Department dc:contributor.department

Massachusetts Institute of Technology. Department of Materials Science and Engineering

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

2020

Author dc:creator

• Kim, Sunho,Ph.D.Massachusetts Institute of Technology.

Advisor dc:contributor.advisor

• Harry L. Tuller.

• Materials Science and Engineering.

Statement dc:rights

• MIT theses may be protected by copyright. Please reuse MIT thesis content according to the MIT Libraries Permissions Policy, which is available through the URL provided.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Handle dc:identifier.uri

https://hdl.handle.net/1721.1/129007

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/129007