Large-area CVD growth of two-dimensional transition metal dichalcogenides and monolayer MoS₂ and WS₂ metal-oxide-semiconductor field-effect transistors

Two-dimensional semiconducting materials such as MoS₂ and WS₂ have been attractive for use in ultra-scaled electronic and optoelectronic devices because of their atomically-thin thickness, direct band gap, and lack of dangling bonds. Methods for large-area growth of 2D semiconducting materials are needed to bring them to practical applications. This thesis aims to develop reliable methods for growing high-quality monolayer MoS₂ and WS₂ by CVD and explore their intrinsic electrical transport properties for electronic and optoelectronic device applications. The as-grown monolayer MoS₂ and WS₂ exhibit n-type semiconducting behavior with excellent optical properties. Various techniques are employed to characterize the CVD-grown materials, including photoluminescence, UV-visible absorption, Raman spectroscopy, X-ray photoelectron spectroscopy, and atomic force microscopy. Moreover, the electronic transport characteristics of single-layer CVD-grown MoS₂ and WS₂ field-effect transistors with a back-gated configuration are demonstrated.

Department dc:contributor.department

Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science.

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

2017

Author dc:creator

• Shen, Pin-Chun

Advisor dc:contributor.advisor

• Jing Kong.

• Electrical Engineering and Computer Science.

Statement dc:rights

• MIT theses are protected by copyright. They may be viewed, downloaded, or printed from this source but further reproduction or distribution in any format is prohibited without written permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/1721.1/112003

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/112003