Development of nanofocusing refractive X-ray lenses

According to the results of this work the following conclusions can be made:•The microfabrication process of silicon nanofocusing lenses is optimised. With these lenses a lateral resolution of 50 nm was achieved and this resolution approaches the theoretical limit. Using the same process for the fabrication of silicon adiabatically focusing lenses (AFL) a lateral resolution of 20 nm and below can be reached. •Silicon nanofocusing refractive x-ray lenses are useful optical components for nanofluorescence tomography, nanodiffraction and other techniques done at third generation synchrotron radiation sources. Using these lenses, the analysis of structural transformations in thin films of phase change media and the investigation of residual stress in aluminium mirrors were made. In future, fluorescence tomography experiments with a resolution in the range of 100 nm are feasible. •To fabricate nanofocusing x-ray lenses made of boron, sapphire or diamond, improved microfabrication techniques are required. In the case of boron, a polishing machine is needed, which allows the boron surface to be smooth and flat, simultaneously. For the etching of sapphire and diamond, a ICP etching system is required. Using such a system, vertical sidewalls of the etched structures may be at hand.

Grantor dc:publisher

Publikationsserver der RWTH Aachen University

Year dc:date

2006

Author dc:creator

• Kurapova, Olga

Contributors dc:contributor

• Lengeler, Bruno

• info:eu-repo/classification/ddc/530
• Physik
• Röntgenoptik
• Synchrotronstrahlung
• E-beam Lithographie
• Ätzen
• refraktive Linsen
• x-ray optics
• refractive lenses
• e-beam lithography
• deep reactive ion etching

Statement dc:rights

• info:eu-repo/semantics/openAccess

Language dc:language

eng

Identifier

https://publications.rwth-aachen.de/search?p=id:%22RWTH-CONV-122259%22

OAI identifier oai:identifier

oai:publications.rwth-aachen.de:60556